Non Destructive Optical Analysis of Implanted Layers in GaAs by Raman Scattering and Spectroscopic Ellipsometry
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ABSTRACTNon destructive analysis by Raman Scattering (RS) and Spectroscopic Ellipsometry (SE) is demonstrated on B+- and Se+ shallow implanted GaAs. Qualitative informations are obtained from 1st and 2nd order RS spectra. The former are analysed using the intensity ratio of the T0 and L0 modes, which defines a lattice potential perfection scale. The SE analysis of the E1, E1 +Δ1 structure in the imaginary part of the dielectric function confirms the RS results and its multilayer analysis yields the depth profile of the implanted ions.
2017 ◽
Vol 225
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pp. 012060
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2021 ◽
Vol 248
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pp. 119290
1974 ◽
Vol 36
(1)
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pp. 179-186
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