A Low Temperature CVD Process for TiN Coatings

1989 ◽  
Vol 168 ◽  
Author(s):  
A. Aguero ◽  
D. Little ◽  
P. Lowden
Keyword(s):  
Wear Resistance ◽  
Low Temperature ◽  
Titanium Nitride ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Reduced Pressure ◽  
Tin Coatings ◽  
Excellent Adhesion ◽  
Low Temperature Process

AbstractA novel low temperature process for the chemical vapour deposition of titanium nitride films has been developed. Titanium sub-halides generated “in situ” by chlorination of titanium pellets are subsequently reacted with ammonia at reduced pressure and temperatures of 450–600° C. The coatings have excellent adhesion and wear resistance. A description of the process and the properties of the coatings produced by it will be presented.

Epitaxial silicon growth on porous silicon by reduced pressure, low temperature chemical vapour deposition

1989 ◽  
Vol 4 (1-4) ◽  
pp. 435-439 ◽  
Author(s):  
C. Oules ◽  
A. Halimaoui ◽  
J.L. Regolini ◽  
R. Herino ◽  
A. Perio ◽  
...  
Keyword(s):  
Porous Silicon ◽  
Low Temperature ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Epitaxial Silicon ◽  
Reduced Pressure ◽  
Silicon Growth

Growth of complex SiGe/Ge superlattices by reduced pressure chemical vapour deposition at low temperature

2015 ◽  
Vol 30 (11) ◽  
pp. 114009 ◽  
Author(s):  
John E Halpin ◽  
Stephen D Rhead ◽  
Ana M Sanchez ◽  
Maksym Myronov ◽  
David R Leadley
Keyword(s):  
Low Temperature ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Reduced Pressure ◽  
Pressure Chemical

Epitaxial growth of Co3O4 films by low temperature, low pressure chemical vapour deposition

2001 ◽  
Vol 231 (1-2) ◽  
pp. 242-247 ◽  
Author(s):  
K. Shalini ◽  
Anil U. Mane ◽  
S.A. Shivashankar ◽  
M. Rajeswari ◽  
S. Choopun
Keyword(s):  
Low Temperature ◽  
Epitaxial Growth ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Pressure Chemical

Low-temperature synthesis of vertically aligned graphene through microwave-assisted chemical vapour deposition

2021 ◽  
pp. 138801
Author(s):  
Justyna Kulczyk-Malecka ◽  
Isabella V.J. dos Santos, ◽  
Marine Betbeder ◽  
Samuel Rowley-Neale ◽  
Zhaohe Gao ◽  
...  
Keyword(s):  
Low Temperature ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Temperature Synthesis ◽  
Temperature Synthesis ◽  
Microwave Assisted ◽  
Vertically Aligned

scholarly journals Self-organized graphene-like boron nitride containing nanoflakes on copper by low-temperature N2 + H2 plasma

RSC Advances ◽  
2016 ◽  
Vol 6 (90) ◽  
pp. 87607-87615 ◽  
Author(s):  
B. B. Wang ◽  
D. Gao ◽  
I. Levchenko ◽  
K. Ostrikov ◽  
M. Keidar ◽  
...  
Keyword(s):  
Low Temperature ◽  
Boron Nitride ◽  
Chemical Vapour Deposition ◽  
Efficient Method ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Self Organized ◽  
Reactive Gases ◽  
Hot Filament

A simple and efficient method for synthesizing complex graphene-inspired BNCO nanoflakes by plasma-enhanced hot filament chemical vapour deposition using B4C as a precursor and N2/H2 reactive gases is reported.

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