GaAs Quantum Well Infrared Photodetectors Grown by OMVPE

1990 ◽  
Vol 216 ◽  
Author(s):  
W. S. Hobson ◽  
A. Zussman ◽  
B. F. Levine ◽  
S. J. Pearton ◽  
V. Swaminathan ◽  
...  

ABSTRACTWe have grown, fabricated, and measured GaAs quantum well infrared photodetectors (QWIPs) using organometallic vapor phase epitaxy (OMVPE). The epitaxial layers were characterized by electrochemical capacitance-voltage profiling, double-crystal X-ray diffraction, cathodoluminescence, and infrared absorption. Dark current, responsivity spectra, and detectivity were measured for the QWIP devices. The performance of these QWIPs was comparable to detectors grown using MBE. This is of importance since OMVPE has advantages for wafer throughout and cost.

2009 ◽  
Vol 52 (6) ◽  
pp. 220-223 ◽  
Author(s):  
Fabrizio Castellano ◽  
Rita C. Iotti ◽  
Fausto Rossi ◽  
Jerome Faist ◽  
Emmanuel Lhuillier ◽  
...  

1993 ◽  
Vol 73 (4) ◽  
pp. 2029-2031 ◽  
Author(s):  
H. C. Liu ◽  
A. G. Steele ◽  
M. Buchanan ◽  
Z. R. Wasilewski

1999 ◽  
Vol 33 (2) ◽  
pp. 162-169
Author(s):  
Kwok-Keung Chong ◽  
Mau-Phon Houng ◽  
Yeong-Her Wang ◽  
Chang-Hsing Chu ◽  
Chen-I Hung

1990 ◽  
Vol 204 ◽  
Author(s):  
S.D. Tyagi ◽  
H. Ehsani ◽  
S.K. Ghandhi

ABSTRACTDoping of indium phosphide, grown by organometallic vapor phase epitaxy (OMVPE), has been carried out using hydrogen sulfide. For low partial pressures of H2S, the carrier concentration in the epitaxial layers is found to increase linearly. However, for higher partial pressures a region of superlinear doping is seen. For still higher partial pressures, a rapid decrease in carrier concentration is seen. In the linear region, the doping has a weak dependence on phosphine pressure, however, peak carrier concentration is higher for lower phosphine pressures.The layers were studied using Hall Effect and Double Crystal X-Ray Diffraction, in order to elucidate the nature of impurities and compensating centers introduced. A model which explains the above characteristics is proposed for S incorporation in MOVPE grown InP.


1986 ◽  
Vol 90 ◽  
Author(s):  
I. B. Bhat ◽  
N. R. Taskar ◽  
J. Ayers ◽  
K. Patel ◽  
S. K. Ghandhi

ABSTRACTCadmium telluride layers were grown on InSb substrates by organometallic vapor phase epitaxy and examined using secondary ion mass spectrometry (SIMS), photoluminescence (Pb) and double crystal x-ray diffraction (DCD). The substrate temperature and the nature of the surface prior to growth are shown to be the most important parameters which influence the quality of CdTe layers. Growth on diethyltelluride (DETe) stabilized InSb substrates resulted in CdTe growth with a misorientation of about 4 minutes of arc with respect to the substrates. On the other hand, the grown layers followed the orientation of the substrates when a dimethylcadmium (DMCd) stabilized InSb was used. Growth at 350°C resulted in the smallest x-ray rocking curve (DCRC) full width at half maximum (FWHM) of about 20 arc seconds.


2007 ◽  
Vol 56 (9) ◽  
pp. 5424
Author(s):  
Xiong Da-Yuan ◽  
Li Ning ◽  
Xu Wen-Lan ◽  
Zhen Hong-Lou ◽  
Li Zhi-Feng ◽  
...  

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