Characterization of Vacancy-Type Defects in Ion Implanted and Annealed SiC by Positron Annihilation Spectroscopy
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ABSTRACTNew examples of characterization of vacancy-type defects in ion implanted and annealed SiC by the established technique of slow positron implantation spectroscopy are presented. In particular, the estimation of the depths of damaged regions and their change (a) after post-irradiation annealing, or (b) due to variation of substrate temperature during implantation, is addressed.
1995 ◽
Vol 196-201
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pp. 1165-1170
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2008 ◽
Vol 17
(2)
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pp. 160-164
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2010 ◽
Vol 19
(6)
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pp. 489-494
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2004 ◽
Vol 42
(13)
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pp. 2441-2459
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1999 ◽
Vol 12
(5)
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pp. 739-742