Photonic Bandgap Formation by Wafer Bonding and Delamination
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AbstractA new approach for one-dimensional photonic bandgap formation is introduced. The method consists of wafer bonding and delamination, which is capable of stacking single crystalline semiconductor layers on non-crystalline insulator layers. Si and SiO2 layers with sub-wavelength periodicity are successfully stacked to form photonic crystals consisting of 3 pairs without a defect layer and of 4.5 pairs with a defect layer. The transmittance spectra are well reproduced by transfer matrix calculations. This clearly verifies the potential of the wafer bonding and delamination method.
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2006 ◽
Vol 23
(7)
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pp. 1451
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2020 ◽
Vol 129
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pp. 106293
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