Electronic Transport in Hydrogenated Amorphous Silicon

1986 ◽  
Vol 70 ◽  
Author(s):  
M. Silver ◽  
D. Adler ◽  
M. P. Shaw ◽  
V. Cannella ◽  
J. McGill

ABSTRACTThe puzzles regarding the magnitude of the free electron mobility in hydrogenated amorphous silicon are examined. It is suggested that highlevel double injection produces a metastable increase in the carrier mobility by neutralizing positively and negatively charged defect states thereby eliminating long-range potential fluctuations. Since these defect states cannot be neutralized under low-level or single injection, they both contribute to the modulation of the conduction band and increase the freecarrier scattering. If the latter is the predominant scattering mechanism, the neutralization of charged defects directly leads to a mobility increase under double-injection conditions. We discuss the various implications of this model, and present recent experimental results in agreement with these ideas.

2011 ◽  
Vol 1321 ◽  
Author(s):  
Bin Cai ◽  
D. A. Drabold

ABSTRACTIn a-Si:H, large concentrations of B or P (of order 1%) are required to dope the material, suggesting that doping mechanisms are very different than for the crystal for which much smaller concentrations are required. In this paper, we report simulations on B and P introduced into realistic models of a-Si:H and a-Si, with concentrations ranging from 1.6% to 12.5% of B or P in the amorphous host. The results indicate that tetrahedral B and P are effective doping configurations in a-Si, but high impurity concentrations introduce many defect states. For a-Si:H, we report that both B(3,1) and P(3,1) (B or P atom bonded with three Si atoms and one H atom) are effective doping configurations. We investigate H passivation in both cases. For both B and P, there exists a “hydrogen poison range” of order 6 Å for which H in a bond-center site can suppress doping. For B doping, nearby H prefers to stay at the bond-center of Si-Si, leaves B four-fold and neutralizes the doping configuration; for P doping, nearby H spoils the doping by inducing a reconstruction rendering initially tetrahedral P three-fold.


1991 ◽  
Vol 219 ◽  
Author(s):  
Gaorong Han ◽  
Jianmin Qiao ◽  
Piyi Du ◽  
Zhonghua Jiang ◽  
Zishang Ding

ABSTRACTWe have presented ESR and PAS measurements for a series of a-SiS:H and a-Si: H films deposited by glow discharge at different parameters. The spin density in a-SiS:H alloys measured by ESR is essentially independent of the sulphur content, while the density of defects measured by PAS increases significantly with the increasing of sulphur content. The ESR signals in a-SiS:H alloys strongly depend on both annealing and illumination. The spin density increases up to 540°C and then decreases with raising annealing temperature for a-SiS:H and a-Si:H alloys. The results suggest that some new defects such as molecular hydrogen and microvoids are appeared when addition of sulphur to a-Si:H films.


1994 ◽  
Vol 76 (4) ◽  
pp. 2260-2263 ◽  
Author(s):  
Mehmet Güneş ◽  
Christopher R. Wronski ◽  
T. J. McMahon

1983 ◽  
Vol 27 (8) ◽  
pp. 4861-4871 ◽  
Author(s):  
Warren B. Jackson ◽  
R. J. Nemanich ◽  
Nabil M. Amer

1992 ◽  
Vol 71 (9) ◽  
pp. 4344-4353 ◽  
Author(s):  
I. Sakata ◽  
M. Yamanaka ◽  
S. Numase ◽  
Y. Hayashi

1987 ◽  
Vol 95 ◽  
Author(s):  
Z E. Smith ◽  
S. Wagner

AbstractThe experimental phenomena associated with light-induced degradation and thermal recovery of hydrogenated amorphous silicon (a-Si:H) films are reviewed, with special emphasis on the limitations of each experimental technique. When several techniques are used in concert, a fuller picture emerges. Recent experiments suggest different positions in the band-gap of the paramagnetic-associated defect states (the dangling bonds) for doped and undopedfilms; this information can be combined with conductivity, sub-bandgap optical absorption and electron spin resonance data to yield a model for the density of gap states (DOS) in a- Si:H, including how the DOS changes upon illumination and annealing.


1988 ◽  
Vol 57 (6) ◽  
pp. 715-720 ◽  
Author(s):  
L. Xu ◽  
G. Winborne ◽  
M. Silver ◽  
V. Cannella ◽  
J. Mcgill

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