The Development of Materials for the Future Vacuum Technology. Surface Coating and Outgassing Rate of Titanium Nitride Films for XHV and UHV Materials.

1993 ◽  
Vol 32 (11) ◽  
pp. 766-774
Author(s):  
Sonoko Tsukahara
2008 ◽  
Vol 49 (7) ◽  
pp. 1638-1643 ◽  
Author(s):  
Satoshi Akamaru ◽  
Yuji Honda ◽  
Akira Taguchi ◽  
Takayuki Abe

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