The Development of Materials for the Future Vacuum Technology. Surface Coating and Outgassing Rate of Titanium Nitride Films for XHV and UHV Materials.
1993 ◽
Vol 32
(11)
◽
pp. 766-774
1993 ◽
Vol 32
(11)
◽
pp. 754-759
1993 ◽
Vol 32
(11)
◽
pp. 811-812
◽
1993 ◽
Vol 32
(11)
◽
pp. 813-816
1974 ◽
Vol 13
(S1)
◽
pp. 81
◽
1993 ◽
Vol 32
(11)
◽
pp. 789-795
2008 ◽
Vol 49
(7)
◽
pp. 1638-1643
◽
1993 ◽
Vol 32
(11)
◽
pp. 803-807
1993 ◽
Vol 32
(11)
◽
pp. 760-765