scholarly journals Electron Diffraction Intensity Analysis of Amorphous Pd75Si25 Alloy Thin Film with Imaging-Plate Technique

1995 ◽  
Vol 36 (7) ◽  
pp. 822-827 ◽  
Author(s):  
Mitsuhide Matsushita ◽  
Yoshihiko Hirotsu ◽  
Kazunori Anazawa ◽  
Tadakatsu Ohkubo ◽  
Tetsuo Oikawa
1994 ◽  
Vol 01 (02n03) ◽  
pp. 221-227 ◽  
Author(s):  
H. HUANG ◽  
S.Y. TONG ◽  
U. MYLER ◽  
K. JACOBI

The Si ((113) 3×1-H structure has been investigated by a quantitative low-energy electron diffraction intensity analysis. A model with two Si dimers in the unit cell gives best agreement between the calculation and the experimental data. Three-dimensional atomic coordinates have been determined.


2007 ◽  
Vol 539-543 ◽  
pp. 2077-2081 ◽  
Author(s):  
Akihiko Hirata ◽  
Yoshihiko Hirotsu ◽  
Kenji Amiya ◽  
Nobuyuki Nishiyama ◽  
Akihisa Inoue

Nanoscale structural change in (Fe0.5Co0.5)72B20Si4Nb4 bulk glassy alloy on annealing has been investigated using transmission electron microscopy. On annealing at temperatures above 773K, electron diffraction intensity analysis showed a clear structure change for a Cr23C6-type local atomic ordering. The local structure formation of Cr23C6-type nanophase was confirmed by nanobeam electron diffraction. A development process of dense precipitates of the Cr23C6-type nanophase was further studied by high-resolution electron microscopy. It was found that the formation of the highly-dense nanoprecipitates provides an increase in Vickers hardness.


2002 ◽  
Vol 517 (1-3) ◽  
pp. 59-64 ◽  
Author(s):  
M. Tagawa ◽  
T. Kawasaki ◽  
C. Oshima ◽  
S. Otani ◽  
K. Edamoto ◽  
...  

1997 ◽  
Vol 71 (8) ◽  
pp. 1053-1055 ◽  
Author(s):  
Wei-Hua Wang ◽  
Qing Wei ◽  
S. Friedrich ◽  
M. P. Macht ◽  
N. Wanderka ◽  
...  

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