scholarly journals Improvement of Resist Characteristics by Synthesis of a Novel Dissolution Inhibitor for Chemically Amplified Three-Component Novolac Resist

2021 ◽  
Vol 34 (5) ◽  
pp. 491-494
Author(s):  
Shinya Akechi ◽  
Hideo Horibe
Keyword(s):  
Chemically Amplified

Heating effect of the radiation chemistry of polyhydroxystyrene-type chemically amplified resists

2020 ◽  
Vol 59 (8) ◽  
pp. 086506
Author(s):  
Yuta Ikari ◽  
Kazumasa Okamoto ◽  
Akihiro Konda ◽  
Takahiro Kozawa ◽  
Takao Tamura
Keyword(s):  
Radiation Chemistry ◽  
Heating Effect ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Chemically amplified resist technology for i-line applications

1998 ◽  
Author(s):  
Medhat A. Toukhy ◽  
Sanjay Malik ◽  
Andrew J. Blakeney ◽  
Karin R. Schlicht
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist

Characterizing acid diffusion lengths in chemically amplified resists from measurements of deprotection kinetics

2014 ◽  
Vol 13 (4) ◽  
pp. 043017 ◽  
Author(s):  
Abhijit A. Patil ◽  
Yogendra Narayan Pandey ◽  
Manolis Doxastakis ◽  
Gila E. Stein
Keyword(s):  
Acid Diffusion ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

scholarly journals Negative-type Chemically Amplified Photosensitive Novolac

2008 ◽  
Vol 21 (1) ◽  
pp. 161-164 ◽  
Author(s):  
Yuta Saito ◽  
katsuhisa Mizoguchi ◽  
Mitsuru Ueda
Keyword(s):  
Negative Type ◽  
Chemically Amplified

Lithographic performance and optimization of chemically amplified single-layer resists for EUV lithography

2000 ◽  
Author(s):  
Takeo Watanabe ◽  
Hiroo Kinoshita ◽  
Atsushi Miyafuji ◽  
Shigeo Irie ◽  
Shigeru Shirayone ◽  
...  
Keyword(s):  
Single Layer ◽  
Chemically Amplified ◽  
Euv Lithography

Design and Lithographic Characteristics of Alicyclic Fluoropolymer for ArF Chemically Amplified Resists

2006 ◽  
Vol 45 (No. 46) ◽  
pp. L1230-L1231
Author(s):  
Katsumi Maeda ◽  
Kaichiro Nakano ◽  
Masamitsu Shirai
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resists

Sub-150-nm electron-beam lithography using AZPN114 chemically amplified resist

1997 ◽  
Author(s):  
Zheng Cui ◽  
R. A. Moody ◽  
Ian M. Loader ◽  
John G. Watson ◽  
Philip D. Prewett
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Postexposure Delay Effect on Linewidth Variation in Base Added Chemically Amplified Resist

2000 ◽  
Vol 147 (10) ◽  
pp. 3833 ◽  
Author(s):  
Chin-Yu Ku ◽  
Jia-Min Shieh ◽  
Tsann-Bim Chiou ◽  
Hwang-Kuen Lin ◽  
Tan Fu Lei
Keyword(s):  
Delay Effect ◽  
Chemically Amplified ◽  
Chemically Amplified Resist
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