Gas phase mixing due to resonant acoustic oscillations in a cavity

1995 ◽  
Author(s):  
L Matta ◽  
C Zhu ◽  
J Jagoda ◽  
B Zinn
2004 ◽  
Vol 151 (1) ◽  
pp. G24 ◽  
Author(s):  
Joseph J. Biernacki ◽  
Ramkumar Subramanian ◽  
Mohammed R. Islam ◽  
Casey Schewe ◽  
Michael C. Rogers
Keyword(s):  

2018 ◽  
Author(s):  
Emma L. Mungall ◽  
Jonathan P. D. Abbatt ◽  
Jeremy J. B. Wentzell ◽  
Gregory R. Wentworth ◽  
Jennifer G. Murphy ◽  
...  

2008 ◽  
Vol 153 (1-2) ◽  
pp. 137-148 ◽  
Author(s):  
S. Frigerio ◽  
H. Thunman ◽  
B. Leckner ◽  
S. Hermansson
Keyword(s):  

1989 ◽  
Vol 22 (2) ◽  
pp. 136-142 ◽  
Author(s):  
Mikio Kawagoe ◽  
Tsutao Otake ◽  
Campbell W. Robinson

Author(s):  
M. R. G. Zoby ◽  
S. Navarro-Martinez ◽  
A. Kronenburg ◽  
A. J. Marquis
Keyword(s):  

Author(s):  
Lulu Ma ◽  
Dongqing Pan ◽  
Yuanyuan Xie ◽  
Fenfen Wang ◽  
Chris Yuan

Experimental investigations of process emissions from atomic layer deposition (ALD) of Al2O3 are accomplished under various temperatures and purge times to understand its environmental sustainability performance. About 93% of Trimethylaluminum (TMA) is found flowing through ALD system without deposition. 2–9 × 104 of ultrafine nanoparticles containing 51.9 ± 4.6% of C, 16.6 ± 0.9% of Al, 31.4 ± 4.1% of O are generated during each cycle of reactions. 0.34–0.38 cm3 of CH4 (25 °C, 1 atm), which takes up 45–51% of C contained in TMA is produced simultaneously. The concentration of nanoparticles drops with the increase of purge time. CH4 also has a trend of decreasing but acts more complex with the largest emission at a short purge time. Compared with temperature, which has limited effects on reactants, purge time changes the time of reaction as well as the degree of gas phase mixing, and therefore greatly influences ALD emissions.


1995 ◽  
Vol 377 ◽  
Author(s):  
L. S. Sidhu ◽  
F. Gaspari ◽  
S. K. O'Leary ◽  
S. Zukotynski

ABSTRACTWe investigate deuterium incorporation into deuterated-hydrogenated amorphous silicon grown by the saddle-field glow-discharge of deuterium and silane. The presence of HD and SiH3D in the discharge suggests strong gas phase mixing. The dominant process of deuterium incorporation into the growing film appears to be the direct reaction between deuterium and the growth surface.


1979 ◽  
Vol 57 (11) ◽  
pp. 1279-1285 ◽  
Author(s):  
D. Colbourne ◽  
D. C. Frost ◽  
C. A. McDowell ◽  
N. P. C. Westwood

HeI photoelectron spectra are reported for pure gas-phase samples of the unstable methylbromamines, CH3NHBr, CH3NBr2, and (CH3)2NBr. Results are also presented for the unsubstituted bromamines NH2Br and NHBr2 obtained as products from a gas-phase mixing of NH3 and Br2. The spectra are compared with those of the corresponding chloramines.


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