Plasma surface interactions in nanoscale processing: Preservation of low-k integrity and high-k gate-stack etching with Si selectivity

2012 ◽  
Author(s):  
Juline Shoeb
2012 ◽  
Vol 76 (6) ◽  
pp. 683-686 ◽  
Author(s):  
N. V. Mamedov ◽  
V. A. Kurnaev ◽  
D. V. Ivanov ◽  
D. N. Sinel’nikov

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