Plasma surface interactions in nanoscale processing: Preservation of low-k integrity and high-k gate-stack etching with Si selectivity
Keyword(s):
High K
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2012 ◽
Vol 76
(6)
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pp. 683-686
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2000 ◽
Vol 97
(1)
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pp. 23-27
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Keyword(s):
2008 ◽
Vol 28
(4)
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pp. 429-466
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2017 ◽
Vol 35
(5)
◽
pp. 05C203
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Keyword(s):