scholarly journals The Electronic Structural and Defect-Induced Absorption Properties of a Ca2B10O14F6 Crystal

Crystals ◽  
2021 ◽  
Vol 11 (11) ◽  
pp. 1430
Author(s):  
Xuejiao Wang ◽  
Benyan Xu ◽  
Kunpeng Wang ◽  
Zhenyou Li ◽  
Jianxiu Zhang ◽  
...  

Comprehensive ab initio electronic structure calculations were performed for a newly developed deep-ultraviolet (DUV) non-linear optical (NLO) crystal Ca2B10O14F6 (CBOF) using the first principle method. Fifteen point defects including interstitial, vacancy, antisite, Frenkel, and Schottky of Ca, O, F, and B atoms in CBOF were thoroughly investigated as well as their effects on the optical absorption properties. Their formation energies and the equilibrium concentrations were also calculated by ab initio total energy calculations. The growth morphology was quantitatively analyzed using the Hartman–Perdok approach. The formation energy of interstitial F (Fi) and antisite defect OF were calculated to be approximately 0.33 eV and 0.83 eV, suggesting that they might be the dominant defects in the CBOF material. The absorption centers might be induced by the O and F vacancies (VF, VO), interstitial B and O (Oi, Bi), and the antisite defect O substitute of F (OF), which might be responsible for lowering the damage threshold of CBOF. The ionic conductivity might be increased by the Ca vacancy (Vca), and, therefore, the laser-induced damage threshold decreases.

2015 ◽  
Vol 55 (1) ◽  
pp. 104 ◽  
Author(s):  
Marius Mrohs ◽  
Lars Jensen ◽  
Stefan Günster ◽  
Thimotheus Alig ◽  
Detlev Ristau

Nanophotonics ◽  
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Elmina Kabouraki ◽  
Vasileia Melissinaki ◽  
Amit Yadav ◽  
Andrius Melninkaitis ◽  
Konstantina Tourlouki ◽  
...  

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.


2020 ◽  
Vol 8 ◽  
Author(s):  
Dahui Wang ◽  
Yinren Shou ◽  
Pengjie Wang ◽  
Jianbo Liu ◽  
Zhusong Mei ◽  
...  

Abstract Single-shot laser-induced damage threshold (LIDT) measurements of multi-type free-standing ultrathin foils were performed in a vacuum environment for 800 nm laser pulses with durations τ ranging from 50 fs to 200 ps. The results show that the laser damage threshold fluences (DTFs) of the ultrathin foils are significantly lower than those of corresponding bulk materials. Wide band gap dielectric targets such as SiN and formvar have larger DTFs than semiconductive and conductive targets by 1–3 orders of magnitude depending on the pulse duration. The damage mechanisms for different types of targets are studied. Based on the measurement, the constrain of the LIDTs on the laser contrast is discussed.


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