One-step fabrication of high refractive index inorganic nanostructures

Direct printing of spin-on functional films is probably the most efficient method to develop low-cost novel photonic nanodevices, such as diffraction gratings, planar waveguides, nano- lasers, and antireflective coatings. For these applications high refractive index transparent materials are demanded; however, this class of materials generally requires inorganic oxides, well known for their hardness, typical of ceramic materials, and so incompatible with a soft character of printable resins. Herein, inorganic high refractive index TiO2 micro- and nano- structures, with unusual depth up to 600 nm and aspect ratio larger than 5, are obtained by combining thermal nanoimprint lithography (NIL) with UV curing. To achieve printed patterns, a hybrid organic-inorganic spin-on film is deposited at low-temperature by sol–gel processing. Two distinct bottom-up synthetic approaches are used, called in situ and ex situ, using titanium isopropoxide (90%) or TiO2 anatase nanoparticles (70%), respectively, and adding a silica sol modified by organic moieties. The two syntheses were optimized to obtain, after patterning by thermal imprint, amorphous or crystalline titania crack-free micro- and nano- patterns for in situ and ex situ, respectively. The further UV irradiation converts imprinted films to totally inorganic patterns, through the titania photocatalytic effect, allowing refractive indexes up to 1.82 at 632 nm to be achieved. This novel strategy of combining thermal imprint with UV exposure allows inorganic deep patterns to be fabricated without a calcination step, which is generally needed for inorganic resists processing. Eventually, a thermal treatment only at 300 °C can be applied to achieve a final refractive index of 2 at 632 nm.

Design and Optimization of the Antireflective Coating Properties of Silicon Solar Cells by Using Response Surface Methodology

The design and optimization of a nanostructured antireflective coatings for Si solar cells were performed by using response surface methodology (RSM). RSM was employed to investigate the effect on the overall optical performance of silicon solar cells coated with three different nanoparticle materials of titanium dioxide, aluminum oxide, and zinc oxide nanostructures. Central composite design was used for the optimization of the reflectance process and to study the main effects and interactions between the three process variables: nanomaterial type, the radius of nanoparticles, and wavelength of visible light. In this theoretical study, COMSOL Multiphysics was utilized to design the structures by using the wave optics module. The optical properties of the solar cell’s substrate and the three different nanomaterial types were studied. The results indicated that ZnO nanoparticles were the best antireflective coating candidate for Si, as the ZnO nanoparticles produced the lowest reflection values among the three nanomaterial types. The study reveals that the optimum conditions to reach minimum surface reflections for silicon solar cell were established by using ZnO nanoparticles with a radius of ~38 nm. On average, the reflectance reached ~5.5% along the visible spectral range, and approximately zero reflectance in the 550–600 nm range.