Specification for dimensions of metric long arbors and their accessories for milling machines

2015 ◽  
Keyword(s):  
Author(s):  
Terrence Reilly ◽  
Al Pelillo ◽  
Barbara Miner

The use of transmission electron microscopes (TEM) has proven to be very valuable in the observation of semiconductor devices. The need for high resolution imaging becomes more important as the devices become smaller and more complex. However, the sample preparation for TEM observation of semiconductor devices have generally proven to be complex and time consuming. The use of ion milling machines usually require a certain degree of expertise and allow a very limited viewing area. Recently, the use of an ultra high resolution "immersion lens" cold cathode field emission scanning electron microscope (CFESEM) has proven to be very useful in the observation of semiconductor devices. Particularly at low accelerating voltages where compositional contrast is increased. The Hitachi S-900 has provided comparable resolution to a 300kV TEM on semiconductor cross sections. Using the CFESEM to supplement work currently being done with high voltage TEMs provides many advantages: sample preparation time is greatly reduced and the observation area has also been increased to 7mm. The larger viewing area provides the operator a much greater area to search for a particular feature of interest. More samples can be imaged on the CFESEM, leaving the TEM for analyses requiring diffraction work and/or detecting the nature of the crystallinity.


2020 ◽  
Vol 6 (1) ◽  
pp. 1
Author(s):  
Kuswanto Kuswanto ◽  
Juan Junius ◽  
Anita Christine Sembiring

Facility layout is integrated planning of the flow of a product in an operating system to obtain the most effective and efficient interrelation between workers, materials, machinery, and equipment as well as handling and transferring materials. A company engaged in furniture manufacturing has a problem in its production process, namely, the distance between machines is too far so that it affects the cost of handling materials. Distant workstations are found on profile machines, milling machines, measuring machines, cutting machines. Therefore, improvements must be made to the layout of facilities on the production floor so that facility layout is efficient and material handling costs are reduced. The problem-solving approach used is the Graph Method and CRAFT Algorithm. The results of the research show that material handling costs are reduced by 7.58% or Rp. 17,765 using the CRAFT algorithm.


Author(s):  
Maxwell K. Micali ◽  
Hayley M. Cashdollar ◽  
Zachary T. Gima ◽  
Mitchell T. Westwood

While CNC programmers have powerful tools to develop optimized toolpaths and machining plans, these efforts can be wholly undermined by something as simple as human operator error during fixturing. This project addresses that potential operator error with a computer vision approach to provide coarse, closed-loop control between fixturing and machining processes. Prior to starting the machining cycle, a sensor suite detects the geometry that is currently fixtured using computer vision algorithms and compare this geometry to a CAD reference. If the detected and reference geometries are not similar, the machining cycle will not start, and an alarm will be raised. The outcome of this project is the proof of concept of a low-cost, machine/controller agnostic solution that is applied to CNC milling machines. The Workpiece Verification System (WVS) prototype implemented in this work cost a total of $100 to build, and all of the processing is performed on the self-contained platform. This solution has additional applications beyond milling that the authors are exploring.


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