Instrument resolution of the vertical-type cold-neutron reflectometer at HANARO

2016 ◽  
Vol 68 (9) ◽  
pp. 1099-1108
Author(s):  
Jeong Soo Lee
Langmuir ◽  
2003 ◽  
Vol 19 (19) ◽  
pp. 7794-7795
Author(s):  
Robert Georgii ◽  
Peter Böni ◽  
Nikolai K. Pleshanov

2015 ◽  
Vol 67 (9) ◽  
pp. 1574-1582 ◽  
Author(s):  
Jeong-Soo Lee ◽  
Jaseung Koo ◽  
Ji-Yong So ◽  
Tae Ho Kim ◽  
Sungkyun Park

Author(s):  
L. E. Thomas ◽  
J. S. Lally ◽  
R. M. Fisher

In addition to improved penetration at high voltage, the characteristics of HVEM images of crystalline materials are changed markedly as a result of many-beam excitation effects. This leads to changes in optimum imaging conditions for dislocations, planar faults, precipitates and other features.Resolution - Because of longer focal lengths and correspondingly larger aberrations, the usual instrument resolution parameter, CS174 λ 374 changes by only a factor of 2 from 100 kV to 1 MV. Since 90% of this change occurs below 500 kV any improvement in “classical” resolution in the MVEM is insignificant. However, as is widely recognized, an improvement in resolution for “thick” specimens (i.e. more than 1000 Å) due to reduced chromatic aberration is very large.


Author(s):  
Michael T. Postek

The term ultimate resolution or resolving power is the very best performance that can be obtained from a scanning electron microscope (SEM) given the optimum instrumental conditions and sample. However, as it relates to SEM users, the conventional definitions of this figure are ambiguous. The numbers quoted for the resolution of an instrument are not only theoretically derived, but are also verified through the direct measurement of images on micrographs. However, the samples commonly used for this purpose are specifically optimized for the measurement of instrument resolution and are most often not typical of the sample used in practical applications.SEM RESOLUTION. Some instruments resolve better than others either due to engineering design or other reasons. There is no definitively accurate definition of how to quantify instrument resolution and its measurement in the SEM.


1995 ◽  
Vol 213-214 ◽  
pp. 866-868 ◽  
Author(s):  
P. Vorderwisch ◽  
S. Hautecler ◽  
F. Mezei ◽  
U. Stuhr
Keyword(s):  

Author(s):  
M. V. Bulavin ◽  
A. A. Belyakov ◽  
A. E. Verkhoglyadov ◽  
S. A. Kulikov ◽  
K. A. Mukhin

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