Ultraviolet Laser Induced Damage Characteristic of SiO2 Single Layers

2014 ◽  
Vol 513-517 ◽  
pp. 74-77
Author(s):  
Wei Sun ◽  
Hong Ji Qi ◽  
Zhou Fang ◽  
Zhen Kun Yu ◽  
Hai Yuan Li
Keyword(s):  
Physical Vapor Deposition ◽  
Sol Gel ◽  
Gaussian Model ◽  
Damage Threshold ◽  
Fused Silica ◽  
Threshold Distribution ◽  
Laser Induced Damage ◽  
Damage Characteristic ◽  
Effect Of Surface ◽  
Subsurface Defects

Surface and subsurface defects of optics are of major concern in improving laser induced damage threshold. SiO2single layers were fabricated by physical vapor deposition and sol-gel technique on fused silica substrates. HF acid etching and ultrasonic cleaning process are used to investigate the effect of surface and subsurface defects of substrates on the laser induced damage threshold (1-on-1, 8 ns at 355nm). Experimental data are then fitted with the Gaussian model of threshold distribution, which permits to discriminate different kinds of defects and extract their densities and threshold distribution. The interpretation of these data is further discussed according to their cleaning and fabrication method.

Preparation of high laser-induced damage threshold sol-gel Nb2O5 films with different additives

Optik ◽  
2020 ◽  
Vol 206 ◽  
pp. 164306 ◽  
Author(s):  
Wenzhe Cai ◽  
Yingtian Yang ◽  
Yongqiao Zhu ◽  
Dawei Li ◽  
Cheng Xu
Keyword(s):  
Sol Gel ◽  
Damage Threshold ◽  
High Laser ◽  
Laser Induced Damage

scholarly journals Investigation of laser-induced damage threshold improvement mechanism during ion beam sputtering of fused silica

2017 ◽  
Vol 25 (23) ◽  
pp. 29260 ◽  
Author(s):  
Mingjin Xu ◽  
Feng Shi ◽  
Lin Zhou ◽  
Yifan Dai ◽  
Xiaoqiang Peng ◽  
...  
Keyword(s):  
Ion Beam ◽  
Damage Threshold ◽  
Fused Silica ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Laser Induced Damage

scholarly journals Laser-Induced Point Defects in Fused Silica Irradiated by UV Laser in Vacuum

2014 ◽  
Vol 2014 ◽  
pp. 1-7 ◽  
Author(s):  
Xiaoyan Zhou ◽  
Xinda Zhou ◽  
Jin Huang ◽  
Qiang Cheng ◽  
Fengrui Wang ◽  
...  
Keyword(s):  
Point Defects ◽  
Fluorescence Spectra ◽  
Uv Spectroscopy ◽  
Damage Threshold ◽  
Laser Pulses ◽  
Fused Silica ◽  
Third Harmonic ◽  
Structural Modifications ◽  
Laser Induced Damage ◽  
Induced Defects

High-purity fused silica irradiated by third harmonic of the Nd:YAG laser in vacuum with different laser pulse parameters was studied experimentally. Laser-induced defects are investigated by UV spectroscopy, and fluorescence spectra and correlated to the structural modifications in the glass matrix through Raman spectroscopy. Results show that, for laser fluence below laser-induced damage threshold (LIDT), the absorbance and intensity of fluorescence bands increase with laser energies and/or number of laser pulses, which indicates that laser-induced defects are enhanced by laser energies and/or number of laser pulses in vacuum. The optical properties of these point defects were discussed in detail.

Ultraviolet laser-induced damage on fused silica substrate and its sol-gel coating

2012 ◽  
Vol 37 (12) ◽  
pp. 2364 ◽  
Author(s):  
Xiaoguang Li ◽  
Mark Gross ◽  
Katie Green ◽  
Bob Oreb ◽  
Jun Shen
Keyword(s):  
Sol Gel ◽  
Fused Silica ◽  
Ultraviolet Laser ◽  
Silica Substrate ◽  
Laser Induced Damage

Preparation of sol–gel ZrO2–SiO2 highly reflective multilayer films and laser-induced damage threshold characteristic

Optik ◽  
2011 ◽  
Vol 122 (13) ◽  
pp. 1140-1142 ◽  
Author(s):  
Y.J. Guo ◽  
X.T. Zu ◽  
B.Y. Wang ◽  
X.D. Jiang ◽  
X.D. Yuan ◽  
...  
Keyword(s):  
Sol Gel ◽  
Damage Threshold ◽  
Multilayer Films ◽  
Threshold Characteristic ◽  
Laser Induced Damage

scholarly journals Subsurface defects of fused silica optics and laser induced damage at 351 nm

2013 ◽  
Vol 21 (10) ◽  
pp. 12204 ◽  
Author(s):  
Liu Hongjie ◽  
Huang Jin ◽  
Wang Fengrui ◽  
Zhou Xinda ◽  
Ye Xin ◽  
...  
Keyword(s):  
Fused Silica ◽  
Laser Induced Damage ◽  
Subsurface Defects

scholarly journals Hexagonal boron nitride nanosheets incorporated antireflective silica coating with enhanced laser-induced damage threshold

2018 ◽  
Vol 6 ◽  
Author(s):  
Jing Wang ◽  
Chunhong Li ◽  
Wenjie Hu ◽  
Wei Han ◽  
Qihua Zhu ◽  
...  
Keyword(s):  
Boron Nitride ◽  
High Power ◽  
Damage Threshold ◽  
Fused Silica ◽  
High Power Laser ◽  
Power Laser ◽  
Silica Substrate ◽  
Laser Systems ◽  
Laser Induced Damage ◽  
Ar Coating

Boron nitride (BN) nanosheets incorporated silica antireflective (AR) coating was successfully prepared on fused silica substrate to improve the antilaser-damage ability of transmissive optics used in high-power laser systems. The BN nanosheets were obtained by urea assisted solid exfoliation, and then incorporated into basic-catalyzed silica sols without any further treatment. The transmission electron microscope (TEM) images indicated that the BN nanosheets generally consisted of 2–10 layers. The antireflective BN/$\text{SiO}_{2}$ coating exhibited excellent transmittance as high as 99.89% at 351 nm wavelength on fused silica substrate. The thermal conductivity $0.135~\text{W}\cdot \text{m}^{-1}\cdot \text{K}^{-1}$ of the BN/$\text{SiO}_{2}$ coating with 10% BN addition was about 23% higher than $0.11~\text{W}\cdot \text{m}^{-1}\cdot \text{K}^{-1}$ of the pure $\text{SiO}_{2}$ AR coating. The laser-induced damage threshold (LIDT) of that BN/$\text{SiO}_{2}$ coating is also 23.1% higher than that of pure $\text{SiO}_{2}$ AR coating. This research provides a potential application of BN/$\text{SiO}_{2}$ coatings in high-power laser systems.

The Optimization of Termination in Combined Technique of Magnetorheological Finishing and HF Etching for Laser-Induced Damage Threshold High-Efficiency Improving of Fused Silica

2014 ◽  
Vol 1027 ◽  
pp. 199-202
Author(s):  
Ye Tian ◽  
Xiao Qiang Peng ◽  
Yi Fan Dai ◽  
Feng Shi ◽  
Wen Wan
Keyword(s):  
High Efficiency ◽  
Experimental Parameter ◽  
Damage Threshold ◽  
Fused Silica ◽  
Fdtd Simulation ◽  
Structural Defects ◽  
Process Time ◽  
Optical Elements ◽  
Laser Systems ◽  
Laser Induced Damage

The developing high-power laser systems are requiring higher laser-induced damage threshold (LIDT) and fabrication efficiency of fused silica optical elements. To solve these problems, MRF polishing and HF etching have been combined utilized wiping and passivating structural defects as well as removing impurities. Furthermore, the LIDT improvement is dependent greatly on the corporation of processes. But the LIDT improving mechanism is partly ambiguous yet, that may lead to random or experimental parameter choice and ultimately generate unsatisfied results. Consequently, this paper focuses on the termination mechanism of the process. Atom Force Microscope (AFM) measurement, finite difference time-domain (FDTD) simulation and LIDT test will be utilized to analysis and validate the optimization theoretically and practically. Finally, in one side, the LIDT value of optimized-terminated sample is 16.7J/cm2, which is about the same level (even 3.7% higher) as that of the over-etched one. In another side, the etching process time could be shorted by 32% using the optimized method.

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