High Intensity Laser Ablation of Titanium Target

2011 ◽  
Vol 227 ◽  
pp. 57-61 ◽  
Author(s):  
Kenza Yahiaoui ◽  
Tahar Kerdja ◽  
Smail Malek
Keyword(s):  
Laser Ablation ◽  
Laser Energy ◽  
Thin Film Deposition ◽  
Ablation Rate ◽  
Film Deposition ◽  
Laser Irradiance ◽  
Phase Explosion ◽  
Sem Images ◽  
Laser Breakdown ◽  
The Impact

In thin film deposition by pulsed laser ablation (PLD), the mass ablation rate depends on laser energy, on the pulse duration and on the thermodynamic properties of the ablated materials. In order to optimize the PLD technique and the films quality, the evolution of the amount of the ejected materials with laser irradiance, the SEM images of the laser impacts on the target and the ion yield in the vapour plume, were used. This allows us to predict the different mechanisms that are responsible to mass ablation according to laser irradiance which was ranging from 1.5108W/cm2 to 5.51010 W/cm2. Three diagnostics devices have been used: A quartz microbalance placed in front of the target, where the maximum of materials ejection occurs, a Scanning Electron Microscope (SEM) was used to show the impact morphology evolution with the laser irradiance and a charge collector, biased at negative voltage, was used to measure the ions yield and ions kinetic energy. The results show the evolution from normal evaporation mechanism at moderate laser irradiance to phase explosion mechanism at higher laser irradiance. Laser irradiance threshold for phase explosion onset is well determined by microbalance measurement, SEM micrographic pictures and the laser breakdown in the vapour plume was determined by the charge collector.

Synthesis of BiFeO3 Ceramic Targets and Thin Film Deposition by Laser Ablation

2006 ◽  
Vol 514-516 ◽  
pp. 328-332 ◽  
Author(s):  
Cezarina C. Mardare ◽  
Pedro B. Tavares ◽  
Andréi I. Mardare ◽  
Raluca Savu
Keyword(s):  
Laser Ablation ◽  
Laser Energy ◽  
Ferroelectric Properties ◽  
Hysteresis Loops ◽  
Combustion Method ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
X Ray Diffraction ◽  
X Ray ◽  
Si Substrates

A dense ceramic target of BiFeO3 was synthesized by the urea combustion method. X-ray diffraction indicates that this target is composed of a mixture of phases, the main one is BiFeO3, but Bi46Fe2O72 and Bi2Fe4O9 are also present in small amounts. The BiFeO3 target was used for depositing thin films on Pt/Ti/SiO2/Si substrates by the laser ablation technique. The depositions were made in oxygen atmosphere at pressures in the range between 5x10-3 and 2x10-2mbar, using a KrF laser. The substrate temperatures were 450 or 500°C and the laser energy, the frequency and the distance between the target and the substrate were kept constant at 125mJ, 10Hz and 4cm, respectively. After a deposition time of 30minutes the thickness of the films was approximately 400nm. Some of the films were heat-treated in situ, in 100mbar O2 for 30minutes, at the same temperatures used for deposition. X-ray diffraction results show the BiFeO3 phase, as well as some Bi46Fe2O72 and Bi2Fe4O9. The films were crystallized without any preferential orientation, but the ones made at 2x10-2mbar and 450°C were partially amorphous. For measuring the ferroelectric hysteresis loops, either Al top electrodes were deposited by thermal evaporation or Pt, by sputtering. The distorted shapes of the hysteresis loops obtained indicated that the films exhibit weak ferroelectric properties and high leakage current values.

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

Crystalline SiC thin film deposition by laser ablation: influence of laser surface activation

1998 ◽  
Vol 66 (2) ◽  
pp. 183-187 ◽  
Author(s):  
M. Diegel ◽  
F. Falk ◽  
R. Hergt ◽  
H. Hobert ◽  
H. Stafast
Keyword(s):  
Thin Film ◽  
Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Surface ◽  
Surface Activation

Pulsed Laser Deposition History and Laser-Target Interactions

MRS Bulletin ◽  
1992 ◽  
Vol 17 (2) ◽  
pp. 30-36 ◽  
Author(s):  
Jeff Cheung ◽  
Jim Horwitz
Keyword(s):  
Thin Film ◽  
Laser Beam ◽  
Pulsed Laser Deposition ◽  
Mechanical Energy ◽  
Pulsed Laser ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Deposition ◽  
Small Branch ◽  
The Impact

The laser, as a source of “pure” energy in the form of monochromatic and coherent photons, is enjoying ever increasing popularity in diverse and broad applications from drilling micron-sized holes on semiconductor devices to guidance systems used in drilling a mammoth tunnel under the English Channel. In many areas such as metallurgy, medical technology, and the electronics industry, it has become an irreplaceable tool.Like many other discoveries, the various applications of the laser were not initially defined but were consequences of natural evolution led by theoretical studies. Shortly after the demonstration of the first laser, the most intensely studied theoretical topics dealt with laser beam-solid interactions. Experiments were undertaken to verify different theoretical models for this process. Later, these experiments became the pillars of many applications. Figure 1 illustrates the history of laser development from its initial discovery to practical applications. In this tree of evolution, Pulsed Laser Deposition (PLD) is only a small branch. It remained relatively obscure for a long time. Only in the last few years has his branch started to blossom and bear fruits in thin film deposition.Conceptually and experimentally, PLD is extremely simple, probably the simplest among all thin film growth techniques. Figure 2 shows a schematic diagram of this technique. It uses pulsed laser radiation to vaporize materials and to deposit thin films in a vacuum chamber. However, the beam-solid interaction that leads to evaporation/ablation is a very complex physical phenomenon. The theoretical description of the mechanism is multidisciplinary and combines equilibrium and nonequilibrium processes. The impact of a laser beam on the surface of a solid material, electromagnetic energy is converted first into electronic excitation and then into thermal, chemical, and even mechanical energy to cause evaporation, ablation, excitation, and plasma formation.

AIN thin film deposition by pulsed laser ablation of Al in NH3

1997 ◽  
Vol 295 (1-2) ◽  
pp. 77-82 ◽  
Author(s):  
A. Giardini Guidoni ◽  
A. Mele ◽  
T.M. Di Palma ◽  
C. Flamini ◽  
S. Orlando ◽  
...  
Keyword(s):  
Thin Film ◽  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition

scholarly journals Preparation and Characterization of Alumina Nanoparticles in Deionized Water Using Laser Ablation Technique

2012 ◽  
Vol 2012 ◽  
pp. 1-6 ◽  
Author(s):  
Veeradate Piriyawong ◽  
Voranuch Thongpool ◽  
Piyapong Asanithi ◽  
Pichet Limsuwan
Keyword(s):  
Particle Size ◽  
Laser Ablation ◽  
Absorption Spectra ◽  
Laser Energy ◽  
Spherical Shape ◽  
Deionized Water ◽  
Alumina Nanoparticles ◽  
X Ray Diffraction ◽  
Sem Images ◽  
Xrd Patterns

Al2O3nanoparticles were synthesized using laser ablation of an aluminum (Al) target in deionized water. Nd:YAG laser, emitted the light at a wavelength of 1064 nm, was used as a light source. The laser ablation was carried out at different energies of 1, 3, and 5 J. The structure of ablated Al particles suspended in deionized water was investigated using X-ray diffraction (XRD). The XRD patterns revealed that the ablated Al particles transformed intoγ-Al2O3. The morphology of nanoparticles was investigated by field emission scanning electron microscopy (FE-SEM). The FE-SEM images showed that most of the nanoparticles obtained from all the ablated laser energies have spherical shape with a particle size of less than 100 nm. Furthermore, it was observed that the particle size increased with increasing the laser energy. The absorption spectra of Al2O3nanoparticles suspended in deionized water were recorded at room temperature using UV-visible spectroscopy. The absorption spectra show a strong peak at 210 nmarising from the presence of Al2O3nanoparticles. The results on absorption spectra are in good agreement with those investigated by XRD which confirmed the formation of Al2O3nanoparticles during the laser ablation of Al target in deionized water.

scholarly journals Modeling of plume dynamics in laser ablation processes for thin film deposition of materials

1996 ◽  
Vol 3 (5) ◽  
pp. 2203-2209 ◽  
Author(s):  
J. N. Leboeuf ◽  
K. R. Chen ◽  
J. M. Donato ◽  
D. B. Geohegan ◽  
C. L. Liu ◽  
...  
Keyword(s):  
Thin Film ◽  
Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Plume Dynamics
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