A Model of Coupled Diffusion of Impurity Atoms and Point Defects in the Vicinity of Semiconductor Interfaces and Grain Boundaries

1997 ◽  
Vol 57-58 ◽  
pp. 513-518 ◽  
Author(s):  
Oleg Velichko ◽  
A.K. Fedotov
2002 ◽  
Vol 178 (1) ◽  
pp. 196-209 ◽  
Author(s):  
O.I Velichko ◽  
V.A Dobrushkin ◽  
A.N Muchynski ◽  
V.A Tsurko ◽  
V.A Zhuk

1998 ◽  
Vol 4 (S2) ◽  
pp. 556-557
Author(s):  
S. Stemmer ◽  
G. Duscher ◽  
E. M. James ◽  
M. Ceh ◽  
N.D. Browning

The evaluation of the two dimensional projected atom column positions around a defect or an interface in an electronic ceramic, as it has been performed in numerous examples by (quantitative) conventional high-resolution electron microscopy (HRTEM), is often not sufficient to relate the electronic properties of the material to the structure of the defect. Information about point defects (vacancies, impurity atoms), and chemistry or bonding changes associated with the defect or interface is also required. Such complete characterization is a necessity for atomic scale interfacial or defect engineering to be attained.One instructive example where more than an image is required to understand the structure property relationships, is that of grain boundaries in Fe-doped SrTi03. Here, the different formation energies of point defects cause a charged barrier at the boundary, and a compensating space charge region around it. The sign and magnitude of the barrier depend very sensitively on the atomic scale composition and chemistry of the boundary plane.


2018 ◽  
Vol 159 ◽  
pp. 123-134 ◽  
Author(s):  
Timofey Frolov ◽  
Qiang Zhu ◽  
Tomas Oppelstrup ◽  
Jaime Marian ◽  
Robert E. Rudd

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