The Electrical and Optical Properties of Al-Doped ZnO Films Sputtered in an Ar:H2Gas Radio Frequency Magnetron Sputtering System
2010 ◽
Vol 11
(2)
◽
pp. 81-84
◽
Seung-Taek Hwang
◽
Choon-Bae Park
2009 ◽
Vol 517
(11)
◽
pp. 3265-3268
◽
C. Li
◽
M. Furuta
◽
T. Matsuda
◽
T. Hiramatsu
◽
H. Furuta
◽
...
2012 ◽
Vol 21
(6)
◽
pp. 067306
◽
Shuang Liang
◽
Zeng-Xia Mei
◽
Xiao-Long Du
2008 ◽
Vol 69
(2-3)
◽
pp. 535-539
◽
Jeng-Lin Chung
◽
Jyh-Chen Chen
◽
Chung-Jen Tseng
2016 ◽
Vol 42
(9)
◽
pp. 10847-10853
◽
Yongheng Wu
◽
Cuiping Li
◽
Mingji Li
◽
Hongji Li
◽
Sheng Xu
◽
...
2006 ◽
Vol 515
(4)
◽
pp. 2361-2365
◽
Zheng-bin Gu
◽
Ming-hui Lu
◽
Jing Wang
◽
Chao-ling Du
◽
Chang-sheng Yuan
◽
...
2014 ◽
Vol 40
(5)
◽
pp. 6673-6676
◽
Sun-Kyung Kim
◽
Seung-Hong Kim
◽
So-Young Kim
◽
Jae-Hyun Jeon
◽
Tae-Kyung Gong
◽
...
2003 ◽
Vol 42
(Part 1, No. 1)
◽
pp. 223-227
◽
Hwa-Min Kim
◽
Sang-Kuan Jung
◽
Jeung-Sun Ahn
◽
Young-Jin Kang
◽
Koo-Chul Je
2015 ◽
Vol 117
(24)
◽
pp. 245312
◽
C. C. Singh
◽
T. A. Patel
◽
E. Panda
2005 ◽
Vol 245
(1-4)
◽
pp. 414-419
◽
D.H. Fan
◽
Z.Y. Ning
◽
M.F. Jiang
2020 ◽
Vol 217
(14)
◽
pp. 1900955
Maki Kushimoto
◽
Tadayoshi Sakai
◽
Yoshihiro Ueoka
◽
Shigekazu Tomai
◽
Satoshi Katsumata
◽
...