Fabrication of Surface Relief Optical Elements in Ternary Chalcogenide Thin Films by Direct Laser Writing

Author(s):  
I. Voynarovych ◽  
R. Poehlmann ◽  
S. Schroeter ◽  
M. Vlcek
Author(s):  
C. Moisset ◽  
J-Y. Natoli ◽  
A. Bourgade ◽  
J. Lumeau ◽  
K. Iliopoulos

2021 ◽  
Vol 8 ◽  
pp. 241-247
Author(s):  
Roman I. Kuts ◽  
Victor P. Korolkov ◽  
Vladimir N. Khomutov ◽  
Anatoly I. Malyshev ◽  
Sergey L. Mikerin

This paper presents the results of a study of direct laser writing on thin films of transition metals (Hf, Ti, Zr, Ta, V). The films were deposited on fused silica substrates. A comparison of laser writing on the indicated films is carried out from the point of view of the presence of contour writing. As it was proved earlier, when writing on zirconium films, contour writing leads to formation of periodic nanostructures with a period equal to the writing step (250-500 nm). Materials were identified that are promising from the point of view of writing oxide nanostructures for the further formation of the diffraction phase microrelief of DOEs.


1995 ◽  
Author(s):  
Voldemar P. Koronkevich ◽  
Valery P. Kiryanov ◽  
Victor P. Korolkov ◽  
Alexander G. Poleshchuk ◽  
Vadim V. Cherkashin ◽  
...  

2019 ◽  
Vol 8 ◽  
pp. 34-40
Author(s):  
Roman Kuts ◽  
Victor Korolkov ◽  
Ruslan Shimansky ◽  
Vladimir Khomutov ◽  
Anatoly Malyshev

The paper is devoted to study of the characteristics of thin metal films of zirconium in laser-induced oxidation in order to create a technology for direct laser writing of high-resolution diffractive optical elements. To study the optical characteristics of the recorded structures, we used the method of direct detection of the transmission of microstructures using an optical microscope with video camera. Quantitative characteristics of the dependences of the transmission of the irradiated film on the laser beam power on samples with a film thickness of 80 nm were obtained. The regime of nano-grating formation has been found and studied qualitatively.


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