Growth Kinetics of Ultrathin Silicon Dioxide Films Formed by Rapid Thermal Oxidation
Keyword(s):
2009 ◽
Vol 191
◽
pp. 012032
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Keyword(s):
1988 ◽
Vol 135
(1)
◽
pp. 150-155
◽
1989 ◽
Vol 136
(9)
◽
pp. 2673-2676
◽
1992 ◽
Vol 31
(Part 1, No. 10)
◽
pp. 3436-3439
◽
XPS study of the growth kinetics of thin films obtained by thermal oxidation of germanium substrates
1999 ◽
Vol 101-103
◽
pp. 233-238
◽
Keyword(s):