Growth Kinetics of Ultrathin Silicon Dioxide Films Formed by Rapid Thermal Oxidation

1995 ◽  
Author(s):  
Hisashi FUKUDA ◽  
Katsunori AKASE ◽  
Toshiaki ENDOH ◽  
Shigeru NOMURA
1996 ◽  
Vol 79 (3) ◽  
pp. 1464-1467 ◽  
Author(s):  
N. Koyama ◽  
T. Endoh ◽  
H. Fukuda ◽  
S. Nomura

1984 ◽  
Vol 44 (6) ◽  
pp. 626-628 ◽  
Author(s):  
K. K. Ng ◽  
W. J. Polito ◽  
J. R. Ligenza

2017 ◽  
Vol 121 (24) ◽  
pp. 245308 ◽  
Author(s):  
Fabien Rozé ◽  
Olivier Gourhant ◽  
Elisabeth Blanquet ◽  
François Bertin ◽  
Marc Juhel ◽  
...  

1988 ◽  
Vol 135 (1) ◽  
pp. 150-155 ◽  
Author(s):  
Yukio Miyai ◽  
Kenji Yoneda ◽  
Hiroshi Oishi ◽  
Hirofumi Uchida ◽  
Morio Inoue

1989 ◽  
Vol 136 (9) ◽  
pp. 2673-2676 ◽  
Author(s):  
C. A. Paz de Araujo ◽  
R. W. Gallegos ◽  
Y. P. Huang

1992 ◽  
Vol 31 (Part 1, No. 10) ◽  
pp. 3436-3439 ◽  
Author(s):  
Hisashi Fukuda ◽  
Makoto Yasuda ◽  
Toshiyuki Iwabuchi

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