Influence of Annealing Atmosphere on the Epitaxial Graphene Growth on 3C-SiC (111)/Si (111)

2011 ◽  
Author(s):  
H. R. Aryal ◽  
K. Fujita ◽  
T. Egawa
Nano Letters ◽  
2013 ◽  
Vol 13 (11) ◽  
pp. 5692-5697 ◽  
Author(s):  
Esteban Meca ◽  
John Lowengrub ◽  
Hokwon Kim ◽  
Cecilia Mattevi ◽  
Vivek B. Shenoy

2012 ◽  
Vol 111 (10) ◽  
pp. 104324 ◽  
Author(s):  
Yubin Hwang ◽  
Eung-Kwan Lee ◽  
Heechae Choi ◽  
Kyung-Han Yun ◽  
Minho Lee ◽  
...  

2011 ◽  
Author(s):  
H. Kageshima ◽  
H. Hibino ◽  
H. Yamaguchi ◽  
M. Nagase

2011 ◽  
Vol 3 (1) ◽  
pp. 49-54 ◽  
Author(s):  
N. Camara ◽  
B. Jouault ◽  
A. Caboni ◽  
A. Tiberj ◽  
P. Godignon ◽  
...  

2014 ◽  
Vol 778-780 ◽  
pp. 1150-1153
Author(s):  
Hiroyuki Kageshima ◽  
Hiroki Hibino ◽  
Hiroshi Yamaguchi ◽  
Masao Nagase

The energetics for the Si desorption and the C adsorption at a [11-20] step on SiC(0001) surface are studied using the first-principles calculation. It is found that the [11-20] step is stable and nonreactive. The stability of the step is thought to govern the surface morphology during the graphene formation. It is shown that the Si pressure and the temperature are the control parameters for the surface morphology and the graphene quality.


2011 ◽  
Vol 14 (2) ◽  
pp. K13 ◽  
Author(s):  
Benjamin Hsia ◽  
Nicola Ferralis ◽  
Debbie G. Senesky ◽  
Albert P. Pisano ◽  
Carlo Carraro ◽  
...  

2020 ◽  
Vol 257 (6) ◽  
pp. 1900718
Author(s):  
Yuchen Shi ◽  
Alexei A. Zakharov ◽  
Ivan Gueorguiev Ivanov ◽  
Gholamreza Yazdi ◽  
Mikael Syväjärvi ◽  
...  

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