The kinetic simulation of high-voltage beam discharge at low pressure of nitrogen is fulfilled. The characteristics of particle flows to the tantalum cathode and back reflection of fast nitrogen atoms are calculated. The reflection coefficient equals tens of percents at voltages up to 100 kV. The generation of fast nitrogen atoms may be used for metals and dielectrics nitriding with implantation effect.
Erratum: “Kinetic simulation study of magnetized collisionless shock formation on a terawatt laser system” [Phys. Plasmas 28, 072111 (2021)]
