Journal of Microelectronic Manufacturing
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Published By Journal Of Microelectronic Manufacturing

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scholarly journals Improvement of Environment Stability of an i-Line Chemically Amplified Photoresist

2021 ◽  
Vol 4 (2) ◽  
pp. 1-9
Author(s):  
Haibo Li ◽  
◽  
Qian Yang ◽  
Jia Sun ◽  
Jie Li ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Photoresist

scholarly journals Patterning with Organized Molecules

2021 ◽  
Vol 4 (2) ◽  
pp. 1-6
Author(s):  
Mark Neisser ◽  
◽  
◽  
◽  
◽  
...  

scholarly journals Fast and Robust DCNN Based Lithography SEM Image Contour Extraction Models

2021 ◽  
Vol 4 (1) ◽  
pp. 1-8
Author(s):  
Tao Zhou ◽  
◽  
Xuelong Shi ◽  
Chen Li ◽  
Yan Yan ◽  
...  
Keyword(s):  
Contour Extraction ◽  
Sem Image ◽  
Image Contour

scholarly journals Recent Advances in Organic-inorganic Hybrid Photoresists

2021 ◽  
Vol 4 (1) ◽  
pp. 1-8
Author(s):  
Zhihao Wang ◽  
◽  
Xindi Yao ◽  
Huiwen An ◽  
Yake Wang ◽  
...  
Keyword(s):  
Inorganic Hybrid ◽  
Recent Advances

scholarly journals First-principles Simulations of Tunneling FETs Based on van der Waals MoTe2/SnS2 Heterojunctions with Gate-to-drain Overlap Design

2020 ◽  
Vol 3 (4) ◽  
pp. 1-8
Author(s):  
Kun Luo ◽  
◽  
Kui Gong ◽  
Jiangchai Chen ◽  
Shengli Zhang ◽  
...  
Keyword(s):  
First Principles ◽  
Van Der Waals

scholarly journals Pattern-Centric Computational System for Logic and Memory Manufacturing and Process Technology Development

2020 ◽  
Vol 3 (4) ◽  
pp. 1-8
Author(s):  
Chenmin Hu ◽  
◽  
Khurram Zafar ◽  
Abhishek Vikram ◽  
Geoffrey Ying
Keyword(s):  
Technology Development ◽  
Process Technology ◽  
Computational System

scholarly journals Fast and Accurate Machine Learning Inverse Lithography Using Physics Based Feature Maps and Specially Designed DCNN

2020 ◽  
Vol 3 (4) ◽  
pp. 1-8
Author(s):  
Xuelong Shi ◽  
◽  
Yan Yan ◽  
Tao Zhou ◽  
Xueru Yu ◽  
...  
Keyword(s):  
Machine Learning ◽  
Feature Maps
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