characteristic temperature dependence
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Soft Matter ◽  
2018 ◽  
Vol 14 (9) ◽  
pp. 1596-1607 ◽  
Author(s):  
Saori Minami ◽  
Takumi Watanabe ◽  
Daisuke Suzuki ◽  
Kenji Urayama

Viscoelasticity of dense suspensions of thermosensitive microgel mixtures exhibits characteristic temperature-dependence resulting from colloidal gelation.


2001 ◽  
Vol 63 (11) ◽  
Author(s):  
C. Grazioli ◽  
Z. Hu ◽  
M. Knupfer ◽  
G. Graw ◽  
G. Behr ◽  
...  

1985 ◽  
Vol 46 ◽  
Author(s):  
K. Nauka ◽  
W. Walukiewicz ◽  
J. Lagowski ◽  
H.C. Gatos

AbstractAnnealing of oxygen-rich Czochralski silicon at temperatures between 700°C and 1000°C introduces a new scattering mechanism which correlates very well with the presence of oxide precipitates. In lightly doped crystals (n,p ∼1015cm−3) this mechanism becomes dominant at T<170°C, and it determines to a large extent the value of the electron (hole) mobilities. The effect vanishes upon annealing at 1300°C; such heat treatment causes the dissolution of oxide precipitates. The new component mobility related to precipitates was found to exhibit a characteristic temperature dependence μ ∝ T0.5. This dependence was explained in terms of scattering of free carriers by spacially slowly varying potential associated with oxide precipitates of varying size.


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