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enhance chemical vapor deposition
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Effect of bias voltage on the properties of hydrogenated amorphous carbon films fabricated on CoCrMo alloy by electron cyclotron resonance plasma enhance chemical vapor deposition (ECR-PECVD)
Physics Procedia
◽
10.1016/j.phpro.2011.06.069
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2011
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Vol 18
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pp. 122-127
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Cited By ~ 1
Author(s):
Xingrui Deng
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Y.X. Leng
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H.Sun
◽
Nan Huang
Keyword(s):
Vapor Deposition
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Cyclotron Resonance
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Electron Cyclotron Resonance
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Chemical Vapor
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Carbon Films
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Cocrmo Alloy
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Amorphous Carbon Films
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Hydrogenated Amorphous
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Enhance Chemical Vapor Deposition
◽
Resonance Plasma
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Comparison between SiOC Thin Film by plasma enhance chemical vapor deposition and SiO2 Thin Film by Fourier Transform Infrared Spectroscopy
Journal of the Korean Physical Society
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10.3938/jkps.56.1150
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2010
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Vol 56
(4)
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pp. 1150-1155
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Cited By ~ 56
Author(s):
teresa OH
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Chi Kyu Choi
Keyword(s):
Thin Film
◽
Fourier Transform
◽
Infrared Spectroscopy
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Chemical Vapor Deposition
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Fourier Transform Infrared Spectroscopy
◽
Vapor Deposition
◽
Chemical Vapor
◽
Fourier Transform Infrared
◽
Sio2 Thin Film
◽
Enhance Chemical Vapor Deposition
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