Comparison between SiOC Thin Film by plasma enhance chemical vapor deposition and SiO2 Thin Film by Fourier Transform Infrared Spectroscopy
2010 ◽
Vol 56
(4)
◽
pp. 1150-1155
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2004 ◽
Vol 21
(6)
◽
pp. 1256-1259
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1998 ◽
Vol 145
(9)
◽
pp. 3212-3219
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1999 ◽
Vol 2
(10)
◽
pp. 527
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1995 ◽
Vol 13
(5)
◽
pp. 2355-2367
◽
2000 ◽
Vol 39
(Part 1, No. 3A)
◽
pp. 1074-1079
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