PHYSICAL OR THEOLOGICAL APPROACH TO INVESTIGATE THE SHROUD IMAGE FORMATION BY UV RADIATION?

In this article, we ask ourselves if it is possible that Corona Discharge or Vacuum UV radiation may have been the tools to produce the Shroud body image. We are convinced that both are not appropriate mechanisms. In fact, the start of these processes is based on inconsistent hypotheses for the natural sciences, although all that follows is rational, reasonable and acceptable. However, the big initial mole remains. The complexity of this situation is such that it seems to be in a world in part Transcendent and in part Immanent. Therefore, independently from the possible results that in a next future could be obtained, due to identified photochemical processes, the Scientific Method cannot accept both the hypotheses and, consequently, the experiments. The same is also for the Theological approach which discards both proposals

Efficient Photoresist Residue Removal with 172nm Excimer Radiation

The publication reviews the technique of photoresist residue removal with 172nm excimer radiation. The emission principle of excimer lamps is explained as well as the multi-step cleaning mechanism with vacuum UV radiation (VUV cleaning). Based on this principle, the effect on actual photoresist molecules of wafer cleaning applications is shown. The removal rate for typical resists is plotted as a function of dose as well the SEM picture of a wafer before and after the treatment is presented. As a conclusion, the chances and possible limitations for the usage of this technique are presented.