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Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464)
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Plasma doping: theoretical simulation and use of safer gas
Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464)
◽
10.1109/iwit.2000.928774
◽
2002
◽
Cited By ~ 1
Author(s):
P.K. Chu
Keyword(s):
Theoretical Simulation
◽
Plasma Doping
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Surface reaction doping using gas source for ultra shallow junctions
Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464)
◽
10.1109/iwit.2000.928771
◽
2002
◽
Cited By ~ 2
Author(s):
Y. Kiyota
Keyword(s):
Surface Reaction
◽
Gas Source
◽
Shallow Junctions
◽
Ultra Shallow Junctions
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Perspectives on shallow junction technology from the viewpoint of the ITRS
Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464)
◽
10.1109/iwit.2000.928769
◽
2002
◽
Cited By ~ 1
Author(s):
L.A. Larson
Keyword(s):
Shallow Junction
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Requirements for junction technology from device design
Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464)
◽
10.1109/iwit.2000.928768
◽
2002
◽
Cited By ~ 1
Author(s):
M. Koyanagi
Keyword(s):
Device Design
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Plasma immersion implantation for modification and doping of semiconductor materials: a historical perspective: 1886 to 2000
Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464)
◽
10.1109/iwit.2000.928770
◽
2002
◽
Author(s):
M.I. Current
Keyword(s):
Historical Perspective
◽
Semiconductor Materials
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Present ability and problems of ultra-shallow junction formation by RTA
Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464)
◽
10.1109/iwit.2000.928773
◽
2002
◽
Cited By ~ 4
Author(s):
T. Matsuda
◽
S. Shishiguchi
◽
H. Kitajima
Keyword(s):
Shallow Junction
◽
Junction Formation
◽
Present Ability
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Plasma doping as a tool for the fabrication of ultra-shallow junctions
Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464)
◽
10.1109/iwit.2000.928772
◽
2002
◽
Author(s):
R.B. Liebert
◽
S.R. Walther
◽
S.B. Felch
◽
Ziwei Fang
◽
Bon-Woong Koo
◽
...
Keyword(s):
Plasma Doping
◽
Shallow Junctions
◽
Ultra Shallow Junctions
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In/Sb halo doping and replaced anneal sequence for 80 nm CMOS
Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464)
◽
10.1109/iwit.2000.928775
◽
2000
◽
Author(s):
Y. Toyoshima
◽
K. Miyashita
◽
E. Morifuji
◽
T. Nakayama
◽
H. Yoshimura
Download Full-text
Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464)
Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464)
◽
10.1109/iwit.2000.928767
◽
2000
◽
Keyword(s):
International Workshop
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