Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464)
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Plasma doping: theoretical simulation and use of safer gas

Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464) ◽

10.1109/iwit.2000.928774 ◽

2002 ◽

Cited By ~ 1

Author(s):

P.K. Chu

Keyword(s):

Theoretical Simulation ◽

Plasma Doping

Surface reaction doping using gas source for ultra shallow junctions

Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464) ◽

10.1109/iwit.2000.928771 ◽

2002 ◽

Cited By ~ 2

Author(s):

Y. Kiyota

Keyword(s):

Surface Reaction ◽

Gas Source ◽

Shallow Junctions ◽

Ultra Shallow Junctions

Requirements for junction technology from device design

Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464) ◽

10.1109/iwit.2000.928768 ◽

2002 ◽

Cited By ~ 1

Author(s):

M. Koyanagi

Keyword(s):

Device Design

Perspectives on shallow junction technology from the viewpoint of the ITRS

Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464) ◽

10.1109/iwit.2000.928769 ◽

2002 ◽

Cited By ~ 1

Author(s):

L.A. Larson

Keyword(s):

Shallow Junction

Plasma immersion implantation for modification and doping of semiconductor materials: a historical perspective: 1886 to 2000

Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464) ◽

10.1109/iwit.2000.928770 ◽

2002 ◽

Author(s):

M.I. Current

Keyword(s):

Historical Perspective ◽

Semiconductor Materials

Present ability and problems of ultra-shallow junction formation by RTA

Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464) ◽

10.1109/iwit.2000.928773 ◽

2002 ◽

Cited By ~ 4

Author(s):

T. Matsuda ◽

S. Shishiguchi ◽

H. Kitajima

Keyword(s):

Shallow Junction ◽

Junction Formation ◽

Present Ability

Plasma doping as a tool for the fabrication of ultra-shallow junctions

Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464) ◽

10.1109/iwit.2000.928772 ◽

2002 ◽

Author(s):

R.B. Liebert ◽

S.R. Walther ◽

S.B. Felch ◽

Ziwei Fang ◽

Bon-Woong Koo ◽

...

Keyword(s):

Plasma Doping ◽

Shallow Junctions ◽

Ultra Shallow Junctions

In/Sb halo doping and replaced anneal sequence for 80 nm CMOS

Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464) ◽

10.1109/iwit.2000.928775 ◽

2000 ◽

Author(s):

Y. Toyoshima ◽

K. Miyashita ◽

E. Morifuji ◽

T. Nakayama ◽

H. Yoshimura