2001 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (IEEE Cat. No.01CH37160)
Latest Publications

TOTAL DOCUMENTS

44

(FIVE YEARS 0)

H-INDEX

5

(FIVE YEARS 0)

Published By IEEE

0780365550

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Cost reduction using systematic target setting of the reference fab methodology

2001 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (IEEE Cat. No.01CH37160) ◽

10.1109/asmc.2001.925607 ◽

2002 ◽

Author(s):

R. Plieninger ◽

U. Muller ◽

H. Ehm ◽

W. Reczek

Keyword(s):

Cost Reduction ◽

Download Full-text

Non-contact wafer handling using high-intensity ultrasonics

2001 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (IEEE Cat. No.01CH37160) ◽

10.1109/asmc.2001.925636 ◽

2002 ◽

Author(s):

G. Reinhart ◽

J. Hoeppner ◽

J. Zimmermann

Keyword(s):

Download Full-text

Chemical supplier quality management: the changes and challenges

2001 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (IEEE Cat. No.01CH37160) ◽

10.1109/asmc.2001.925637 ◽

2002 ◽

Author(s):

J. O'Brien ◽

T. Leslie

Keyword(s):

Quality Management ◽

Supplier Quality Management

Download Full-text

A process control strategy based upon device performance metrics

2001 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (IEEE Cat. No.01CH37160) ◽

10.1109/asmc.2001.925613 ◽

2002 ◽

Author(s):

S. Ruegsegger ◽

B. Conchieri

Keyword(s):

Process Control ◽

Control Strategy ◽

Performance Metrics ◽

Device Performance

Download Full-text

The application and validation of a new robust windowing method for the Poisson yield model

2001 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (IEEE Cat. No.01CH37160) ◽

10.1109/asmc.2001.925640 ◽

2002 ◽

Author(s):

R.E. Langford ◽

J.J. Liou ◽

V. Raghavan

Keyword(s):

Yield Model ◽

Poisson Yield Model

Download Full-text

Capacity analysis tool

2001 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (IEEE Cat. No.01CH37160) ◽

10.1109/asmc.2001.925620 ◽

2002 ◽

Author(s):

S. Sisler ◽

E. Merrill ◽

P. Sorrentino

Keyword(s):

Capacity Analysis ◽

Download Full-text

Raman spectroscopy, high pressure phosphine anneal, and the electrical properties of the DRAM capacitor

2001 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (IEEE Cat. No.01CH37160) ◽

10.1109/asmc.2001.925624 ◽

2002 ◽

Author(s):

S. Sawaya

Keyword(s):

Raman Spectroscopy ◽

High Pressure ◽

Electrical Properties

Download Full-text

Automated photolithography critical dimension controls in a complex, mixed technology, manufacturing fab

2001 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (IEEE Cat. No.01CH37160) ◽

10.1109/asmc.2001.925612 ◽

2002 ◽

Author(s):

C. Schneider ◽

J. Smyth ◽

A. Watts

Keyword(s):

Critical Dimension

Download Full-text

Modular silicon-on-insulator process for power devices and power integrated circuits

2001 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (IEEE Cat. No.01CH37160) ◽

10.1109/asmc.2001.925617 ◽

2002 ◽

Author(s):

R.P. Zingg ◽

R. Bonne

Keyword(s):

Integrated Circuits ◽

Silicon On Insulator ◽

Download Full-text

How differentiating between utilization of effective availability and utilization of effective capacity leads to a better understanding of performance metrics

2001 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (IEEE Cat. No.01CH37160) ◽

10.1109/asmc.2001.925609 ◽

2002 ◽

Author(s):

K. Butler ◽

J. Matthews

Keyword(s):

Performance Metrics ◽

Effective Capacity

Download Full-text