1997 2nd International Workshop on Statistical Metrology
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31

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4

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Published By IEEE

0780337379

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Logic product speed evaluation and forecasting during the early phases of process technology development using ring oscillator data

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629404 ◽

2002 ◽

Author(s):

L. Milor ◽

L. Yu ◽

B. Liu

Keyword(s):

Technology Development ◽

Ring Oscillator ◽

Process Technology ◽

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Data optimization in semiconductor manufacturing

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629428 ◽

2002 ◽

Author(s):

D.A. Acree ◽

K. Matsubara

Keyword(s):

Semiconductor Manufacturing ◽

Data Optimization

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Automatic synthesis of equipment recipes from specified wafer-state transitions

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629414 ◽

2002 ◽

Author(s):

J.C. Davis ◽

P.K. Mozumder ◽

R. Burch ◽

C. Fernando

Keyword(s):

State Transitions ◽

Automatic Synthesis

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100% defect inspection with neural network integrated system of in-situ particle monitor and surfscan

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629411 ◽

2002 ◽

Author(s):

V.M.C. Chen ◽

A.W. Chow ◽

Yung-Tao Lin ◽

Yeng-Kaung Peng

Keyword(s):

Neural Network ◽

Integrated System ◽

Defect Inspection

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Statistical simulation methodology for multi-level interconnect contact analysis and step coverage evaluation

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629427 ◽

2002 ◽

Author(s):

I. Kamohara

Keyword(s):

Statistical Simulation ◽

Contact Analysis ◽

Simulation Methodology ◽

Step Coverage ◽

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Simulating the impact of poly-CD wafer-level and die-level variation on circuit performance

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629405 ◽

2002 ◽

Author(s):

B.E. Stine ◽

D.S. Boning ◽

J.E. Chung ◽

D. Ciplickas ◽

J.K. Kibarian

Keyword(s):

Level Variation ◽

Wafer Level ◽

Circuit Performance ◽

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Development of optimum annular illumination: a lithography-TCAD approach

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629418 ◽

2002 ◽

Author(s):

Mien Li ◽

L. Milor ◽

W. Yu

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Elimination of meshing noise in statistical TCAD

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629425 ◽

2002 ◽

Author(s):

V. Axelrad ◽

G. Long ◽

P. Kuepper

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Improvement of RSF for a statistical design of lithographic process

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629417 ◽

2002 ◽

Author(s):

A. Goda ◽

A. Misaka ◽

H. Umimoto ◽

S. Odanaka

Keyword(s):

Statistical Design

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Excursion detection and source isolation in defect inspection and classification [VLSI manufacture]

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629421 ◽

2002 ◽

Author(s):

W. Shindo ◽

E.H. Wang ◽

R. Akella ◽

A.J. Strojwas

Keyword(s):

Defect Inspection

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