Ionized physical vapor deposition - Thin Films
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Published By Elsevier

9780125330275

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Ionized hollow cathode magnetron sputtering

Ionized physical vapor deposition - Thin Films ◽

10.1016/s1079-4050(00)80007-1 ◽

2000 ◽

pp. 95-139 ◽

Author(s):

Kwok F. Lai

Keyword(s):

Magnetron Sputtering ◽

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Contributors

Ionized physical vapor deposition - Thin Films ◽

10.1016/s1079-4050(00)80001-0 ◽

2000 ◽

pp. ix

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Numerical modeling

Ionized physical vapor deposition - Thin Films ◽

10.1016/s1079-4050(00)80010-1 ◽

2000 ◽

pp. 209-248

Author(s):

Ming Li ◽

Michael A. Vyvoda ◽

David B. Graves

Keyword(s):

Numerical Modeling

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Applications and properties of ionized physical vapor deposition films

Ionized physical vapor deposition - Thin Films ◽

10.1016/s1079-4050(00)80008-3 ◽

2000 ◽

pp. 141-179 ◽

Author(s):

John Forster

Keyword(s):

Vapor Deposition ◽

Physical Vapor Deposition ◽

Ionized Physical Vapor Deposition

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Plasma physics

Ionized physical vapor deposition - Thin Films ◽

10.1016/s1079-4050(00)80009-5 ◽

2000 ◽

pp. 181-207 ◽

Author(s):

Jeffrey A. Hopwood

Keyword(s):

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Ionization by radio frequency inductively coupled plasma

Ionized physical vapor deposition - Thin Films ◽

10.1016/s1079-4050(00)80005-8 ◽

2000 ◽

pp. 37-66 ◽

Author(s):

Stevi Rossnagel

Keyword(s):

Radio Frequency ◽

Inductively Coupled Plasma ◽

Inductively Coupled

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Ionization by microwave electron cyclotron resonance plasma

Ionized physical vapor deposition - Thin Films ◽

10.1016/s1079-4050(00)80006-x ◽

2000 ◽

pp. 67-94 ◽

Author(s):

William M. Holber

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Subject index

Ionized physical vapor deposition - Thin Films ◽

10.1016/s1079-4050(00)80011-3 ◽

2000 ◽

pp. 249-253

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The role of ionized physical vapor deposition in integrated circuit fabrication

Ionized physical vapor deposition - Thin Films ◽

10.1016/s1079-4050(00)80003-4 ◽

2000 ◽

pp. 1-7 ◽

Author(s):

Jeffrey A. Hopwood

Keyword(s):

Integrated Circuit ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Integrated Circuit Fabrication ◽

Circuit Fabrication ◽

Ionized Physical Vapor Deposition

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Preface

Ionized physical vapor deposition - Thin Films ◽

10.1016/s1079-4050(00)80002-2 ◽

2000 ◽

pp. xi-xii

Author(s):

Jeffrey A. Hopwood

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