2001 IEEE International Integrated Reliability Workshop. Final Report (Cat. No.01TH8580)
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Electromigration discussion group summary

2001 IEEE International Integrated Reliability Workshop. Final Report (Cat. No.01TH8580) ◽

10.1109/irws.2001.993928 ◽

2005 ◽

Author(s):

H.A. Schafft

Keyword(s):

Discussion Group

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Device reliability discussion /group

2001 IEEE International Integrated Reliability Workshop. Final Report (Cat. No.01TH8580) ◽

10.1109/irws.2001.993929 ◽

2005 ◽

Author(s):

B. Nadir

Keyword(s):

Discussion Group ◽

Device Reliability

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Latent reliability degradation of ultra-thin oxides after heavy ion and γ-ray irradiation

2001 IEEE International Integrated Reliability Workshop. Final Report (Cat. No.01TH8580) ◽

10.1109/irws.2001.993910 ◽

2003 ◽

Cited By ~ 2

Author(s):

B. Wang ◽

J.S. Suehle ◽

E.M. Vogel ◽

J.R. Conley ◽

C.E. Weintraub ◽

...

Keyword(s):

Heavy Ion ◽

Γ Ray

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WLR monitoring methodology for assessing charging damage on oxides thicker than 4nm using antenna structures

2001 IEEE International Integrated Reliability Workshop. Final Report (Cat. No.01TH8580) ◽

10.1109/irws.2001.993920 ◽

2003 ◽

Cited By ~ 3

Author(s):

D. Smeets ◽

A. Martin ◽

J. Fazekas

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Wafer level testing of inter-line reliability in copper/low-k structures

2001 IEEE International Integrated Reliability Workshop. Final Report (Cat. No.01TH8580) ◽

10.1109/irws.2001.993923 ◽

2003 ◽

Cited By ~ 2

Author(s):

G.B. Alers ◽

G. Harm ◽

T. Suwwan De Felipe

Keyword(s):

Wafer Level ◽

Low K

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Positive/negative BT instability in scaled N/P-MOSFETs and MOSCs

2001 IEEE International Integrated Reliability Workshop. Final Report (Cat. No.01TH8580) ◽

10.1109/irws.2001.993917 ◽

2003 ◽

Cited By ~ 4

Author(s):

H. Katto

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Isothermal EM test development for Cu /oxide single damascene interconnect

2001 IEEE International Integrated Reliability Workshop. Final Report (Cat. No.01TH8580) ◽

10.1109/irws.2001.993919 ◽

2003 ◽

Author(s):

A.Y.K. Leong

Keyword(s):

Test Development

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Contribution of gate induced drain leakage to overall leakage and yield loss in digital submicron VLSI circuits

2001 IEEE International Integrated Reliability Workshop. Final Report (Cat. No.01TH8580) ◽

10.1109/irws.2001.993916 ◽

2003 ◽

Author(s):

O. Semenov ◽

A. Pradzynski ◽

M. Sachdev

Keyword(s):

Yield Loss ◽

Vlsi Circuits

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Preliminary investigation of hafnium oxide deposited via atomic layer chemical vapor deposition (ALCVD)

2001 IEEE International Integrated Reliability Workshop. Final Report (Cat. No.01TH8580) ◽

10.1109/irws.2001.993909 ◽

2003 ◽

Cited By ~ 1

Author(s):

J.F. Conley ◽

Y. Ono ◽

D.J. Tweet ◽

W. Zhuang ◽

M. Khaiser ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Hafnium Oxide ◽

Preliminary Investigation ◽

Chemical Vapor ◽

Atomic Layer

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Implementation of FWLR for process reliability monitoring

2001 IEEE International Integrated Reliability Workshop. Final Report (Cat. No.01TH8580) ◽

10.1109/irws.2001.993927 ◽

2003 ◽

Author(s):

K.L. Yap ◽

H.K. Yap ◽

Y.C. Tan ◽

K.F. Lo ◽

M.F. Karim ◽

...

Keyword(s):

Process Reliability ◽

Reliability Monitoring

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2001 IEEE International Integrated Reliability Workshop. Final Report (Cat. No.01TH8580)Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

Electromigration discussion group summary

Device reliability discussion /group

Latent reliability degradation of ultra-thin oxides after heavy ion and γ-ray irradiation

WLR monitoring methodology for assessing charging damage on oxides thicker than 4nm using antenna structures

Wafer level testing of inter-line reliability in copper/low-k structures

Positive/negative BT instability in scaled N/P-MOSFETs and MOSCs

Isothermal EM test development for Cu /oxide single damascene interconnect

Contribution of gate induced drain leakage to overall leakage and yield loss in digital submicron VLSI circuits

Preliminary investigation of hafnium oxide deposited via atomic layer chemical vapor deposition (ALCVD)

Implementation of FWLR for process reliability monitoring

2001 IEEE International Integrated Reliability Workshop. Final Report (Cat. No.01TH8580)
Latest Publications