Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications
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Published By BENTHAM SCIENCE PUBLISHERS

9781608051564

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Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications ◽

10.2174/9781608051564113010004 ◽

2013 ◽

pp. viii-xi

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Application of Oxynitrides for Microelectronic Devices and Gas Barriers

Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications ◽

10.2174/9781608051564113010016 ◽

2013 ◽

pp. 285-339

Keyword(s):

Microelectronic Devices

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Oxynitrides and Oxides Deposited by Cathodic Vacuum Arc

Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications ◽

10.2174/9781608051564113010015 ◽

2013 ◽

pp. 265-284 ◽

Cited By ~ 1

Keyword(s):

Vacuum Arc

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Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas

Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications ◽

10.2174/9781608051564113010010 ◽

2013 ◽

pp. 133-162

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Reactive Gas

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Modelling of Reactive Sputter Deposition of Oxynitrides

Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications ◽

10.2174/9781608051564113010005 ◽

2013 ◽

pp. 3-26

Keyword(s):

Sputter Deposition ◽

Reactive Sputter Deposition

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Exploring the Potential of High Power Impulse Magnetron Sputtering for Tailoring the Chemical Composition and the Properties in Metal Oxynitride Films

Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications ◽

10.2174/9781608051564113010007 ◽

2013 ◽

pp. 51-63

Keyword(s):

Chemical Composition ◽

Magnetron Sputtering ◽

High Power

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A Comprehensive Study of the Properties of Sputtered NbOxNy Thin Films

Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications ◽

10.2174/9781608051564113010011 ◽

2013 ◽

pp. 163-194

Keyword(s):

Thin Films ◽

Comprehensive Study

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Preface

Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications ◽

10.2174/9781608051564113010003 ◽

2013 ◽

pp. v-vii

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About the Editors

Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications ◽

10.2174/9781608051564113010001 ◽

2013 ◽

pp. i-iii

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Subject Index

Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications ◽

10.2174/9781608051564113010018 ◽

2013 ◽

pp. 342-345

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