High k Gate Dielectrics - Series in Material Science and Engineering
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Published By Taylor &Amp; Francis

9780750309066, 9781420034141

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Device integration issues

High k Gate Dielectrics - Series in Material Science and Engineering ◽

10.1201/9781420034141.sec5 ◽

2003 ◽

Author(s):

E Young ◽

V Kaushik

Keyword(s):

Device Integration

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Device architectures for the nano-CMOS era

High k Gate Dielectrics - Series in Material Science and Engineering ◽

10.1201/9781420034141.ch5.2 ◽

2003 ◽

Author(s):

Simon Deleonibus

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Electronic structure and band offsets of high-dielectric-constant gate oxides

High k Gate Dielectrics - Series in Material Science and Engineering ◽

10.1201/9781420034141.ch4.3 ◽

2003 ◽

Author(s):

J Robertson ◽

P Peacock

Keyword(s):

Dielectric Constant ◽

Electronic Structure ◽

High Dielectric Constant ◽

Gate Oxides ◽

Band Offsets ◽

High Dielectric

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Chemical bonding and electronic structure of high- k transition metal dielectrics

High k Gate Dielectrics - Series in Material Science and Engineering ◽

10.1201/9781420034141.ch4.2 ◽

2003 ◽

Author(s):

Gerald Lucovsky ◽

Jerry Whitten

Keyword(s):

Electronic Structure ◽

Transition Metal ◽

Chemical Bonding ◽

High K

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Foreword

High k Gate Dielectrics - Series in Material Science and Engineering ◽

10.1201/9781420034141.fmatt1 ◽

2003 ◽

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High-k transistor characteristics

High k Gate Dielectrics - Series in Material Science and Engineering ◽

10.1201/9781420034141.ch5.3 ◽

2003 ◽

Author(s):

Katsunori Onishi ◽

Jack Lee

Keyword(s):

High K

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Band alignment at the interfaces of Si and metals with high-permittivity insulating oxides

High k Gate Dielectrics - Series in Material Science and Engineering ◽

10.1201/9781420034141.ch3.3 ◽

2003 ◽

Author(s):

V Afanas’ev ◽

A Stesmans

Keyword(s):

Band Alignment ◽

High Permittivity

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Defects and defect-controlled behaviour in high- k materials

High k Gate Dielectrics - Series in Material Science and Engineering ◽

10.1201/9781420034141.sec4 ◽

2003 ◽

Author(s):

Marshall Stoneham ◽

Alexander Shluger ◽

Adam Foster ◽

Marek Szymanski

Keyword(s):

High K ◽

High K Materials

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Atomic layer deposition

High k Gate Dielectrics - Series in Material Science and Engineering ◽

10.1201/9781420034141.sec2 ◽

2003 ◽

Cited By ~ 2

Author(s):

Mikko Ritala

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Layer Deposition

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