2019 IEEE International Integrated Reliability Workshop (IIRW)
Latest Publications

TOTAL DOCUMENTS

46

(FIVE YEARS 46)

H-INDEX

2

(FIVE YEARS 2)

Published By IEEE

9781728122038

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Foreword

2019 IEEE International Integrated Reliability Workshop (IIRW) ◽

10.1109/iirw47491.2019.8989907 ◽

2019 ◽

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RFID Tag Failure after Thermal Overstress

2019 IEEE International Integrated Reliability Workshop (IIRW) ◽

10.1109/iirw47491.2019.8989885 ◽

2019 ◽

Author(s):

Emre Ozturk ◽

Mike J. Dikkers ◽

Kevin M. Batenburg ◽

Cora Salm ◽

Jurriaan Schmitz

Keyword(s):

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Call for papers

2019 IEEE International Integrated Reliability Workshop (IIRW) ◽

10.1109/iirw47491.2019.8989901 ◽

2019 ◽

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Low-Frequency Noise Measurements for Electromigration Characterization in BEOL Interconnects

2019 IEEE International Integrated Reliability Workshop (IIRW) ◽

10.1109/iirw47491.2019.8989897 ◽

2019 ◽

Author(s):

S. Beyne ◽

K. Croes ◽

O. Varela Pedreira ◽

L. Arnoldi ◽

M. H. van der Veen ◽

...

Keyword(s):

Low Frequency ◽

Frequency Noise ◽

Low Frequency Noise ◽

Noise Measurements

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Statistical Characterization of BTI and RTN using Integrated pMOS Arrays

2019 IEEE International Integrated Reliability Workshop (IIRW) ◽

10.1109/iirw47491.2019.8989904 ◽

2019 ◽

Author(s):

B. Stampfer ◽

M. Simicic ◽

P. Weckx ◽

A. Abbasi ◽

B. Kaczer ◽

...

Keyword(s):

Statistical Characterization

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Committees

2019 IEEE International Integrated Reliability Workshop (IIRW) ◽

10.1109/iirw47491.2019.8989898 ◽

2019 ◽

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Moisture Influence on Reliability and Electrical Characteristics of SiOC:H Low-k Dielectric Material

2019 IEEE International Integrated Reliability Workshop (IIRW) ◽

10.1109/iirw47491.2019.8989905 ◽

2019 ◽

Author(s):

Matthias Vidal-Dho ◽

Quentin Hubert ◽

Patrice Gonon ◽

Bernard Pelissier ◽

Pascal Fornara ◽

...

Keyword(s):

Dielectric Material ◽

Electrical Characteristics ◽

Moisture Influence ◽

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A Study on Evaluation of Interface Defect Density on High-K/SiO2/Si and SiO2/Si Gate Stacks using Scanning Nonlinear Dielectric Microscopy

2019 IEEE International Integrated Reliability Workshop (IIRW) ◽

10.1109/iirw47491.2019.8989881 ◽

2019 ◽

Author(s):

Koharu Suzuki ◽

Kohei Yamasue ◽

Yasuo Cho

Keyword(s):

Defect Density ◽

Gate Stacks ◽

Nonlinear Dielectric ◽

High K ◽

Interface Defect

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Boxcar Averaging Based Scanning Nonlinear Dielectric Microscopy and Its Application to Carrier Distribution Imaging on 2D Semiconductors

2019 IEEE International Integrated Reliability Workshop (IIRW) ◽

10.1109/iirw47491.2019.8989887 ◽

2019 ◽

Author(s):

Kohei Yamasue ◽

Yasuo Cho

Keyword(s):

Carrier Distribution ◽

Nonlinear Dielectric ◽

2D Semiconductors

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TDDB in a Deuterated Low-k Interlayer Dielectric

2019 IEEE International Integrated Reliability Workshop (IIRW) ◽

10.1109/iirw47491.2019.8989884 ◽

2019 ◽

Author(s):

J. R. Lloyd ◽

P. M. Lenahan ◽

N. Mahmud ◽

R. J. Waskiewicz

Keyword(s):

Interlayer Dielectric ◽

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