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2012 IEEE International Meeting for Future of Electron Devices, Kansai
Latest Publications
TOTAL DOCUMENTS
81
(FIVE YEARS 0)
H-INDEX
4
(FIVE YEARS 0)
Published By IEEE
9781467308366, 9781467308373
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Latest Documents
Most Cited Documents
Contributed Authors
Related Sources
Related Keywords
Bandgap widening of β-FeSi2 deposited by RF-sputtering method using a Si-rich FeSi4 target
2012 IEEE International Meeting for Future of Electron Devices, Kansai
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10.1109/imfedk.2012.6218611
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2012
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Author(s):
Keiichiro Hiehata
◽
Yoshiaki Shimamoto
◽
Kazuhiro Nakamura
Keyword(s):
Rf Sputtering
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Poster session [breaker page]
2012 IEEE International Meeting for Future of Electron Devices, Kansai
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10.1109/imfedk.2012.6218589
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2012
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Keyword(s):
Poster Session
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Observation of conductive filament formation in an organic non-volatile memory resistor device
2012 IEEE International Meeting for Future of Electron Devices, Kansai
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10.1109/imfedk.2012.6218570
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2012
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Cited By ~ 1
Author(s):
T. T. Dao
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T. V. Tran
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K. Higashimine
◽
H. Okada
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D. Mott
◽
...
Keyword(s):
Filament Formation
◽
Conductive Filament
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Non Volatile Memory
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Volatile Memory
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Fabrication of nano-patterns using quick gel-nanoimprint process
2012 IEEE International Meeting for Future of Electron Devices, Kansai
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10.1109/imfedk.2012.6218583
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2012
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Cited By ~ 5
Author(s):
Shinji Araki
◽
Min Zhang
◽
Takahiro Doe
◽
Li Lu
◽
Masahiro Horita
◽
...
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An estimation of the inversion charge influenced by quantum effect for sub-20nm MOSFETs
2012 IEEE International Meeting for Future of Electron Devices, Kansai
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10.1109/imfedk.2012.6218596
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2012
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Author(s):
Masahiro Yamamoto
◽
Akira Hiroki
◽
Jong Chul Yoon
Keyword(s):
Quantum Effect
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Inversion Charge
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A reflection layer for enhanced THz radiation from InAs thin films
2012 IEEE International Meeting for Future of Electron Devices, Kansai
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10.1109/imfedk.2012.6218609
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2012
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Author(s):
K. Nishisaka
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T. Maemoto
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S. Sasa
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K. Takayama
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M. Tonouchi
Keyword(s):
Thin Films
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Thz Radiation
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Inas Thin Films
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Improvement of drain leakage current characteristics in metal-oxide-semiconductor-field-effect-transistor by asymmetric source-drain structure
2012 IEEE International Meeting for Future of Electron Devices, Kansai
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10.1109/imfedk.2012.6218598
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2012
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Cited By ~ 1
Author(s):
Byoungseon Choi
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Hyunae Park
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Dongsoo Kim
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Byoungdeog Choi
Keyword(s):
Metal Oxide
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Leakage Current
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Field Effect
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Field Effect Transistor
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Metal Oxide Semiconductor
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Oxide Semiconductor
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Effect Transistor
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Current Characteristics
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Photoluminescence study on recrystallization of ultra-shallow junction towards in-line measurements
2012 IEEE International Meeting for Future of Electron Devices, Kansai
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10.1109/imfedk.2012.6218592
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2012
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Author(s):
Gota Murai
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Masashi Okutani
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Hiroki Saikusa
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Masahiro Yoshimoto
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Woo Sik Yoo
Keyword(s):
Photoluminescence Study
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Shallow Junction
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Keynote speeches [breaker page]
2012 IEEE International Meeting for Future of Electron Devices, Kansai
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10.1109/imfedk.2012.6218560
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2012
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Download Full-text
Mechanical strain altered gate and substrate currents in n and p-channel MOSFETs
2012 IEEE International Meeting for Future of Electron Devices, Kansai
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10.1109/imfedk.2012.6218577
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2012
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Author(s):
Wangran Wu
◽
Jiabao Sun
◽
Yi Zhao
Keyword(s):
Mechanical Strain
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