ACS Symposium Series - Polymers in Microlithography
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Published By American Chemical Society

0841217017, 0841212686
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Polysilanes: Solution Photochemistry and Deep-UV Lithography

1989 ◽  
pp. 115-132 ◽  
Author(s):  
R. D. Miller ◽  
G. Wallraff ◽  
N. Clecak ◽  
R. Sooriyakumaran ◽  
J. Michl ◽  
...  
Keyword(s):  
Uv Lithography ◽  
Deep Uv

scholarly journals Preface

1989 ◽  
pp. xi-xii
Author(s):  
ELSA REICHMANIS ◽  
SCOTT A. MACDONALD ◽  
TAKAO IWAYANAGI

Nonswelling Negative Resists Incorporating Chemical Amplification

1989 ◽  
pp. 74-85 ◽  
Author(s):  
Jean M. J. Fréchet ◽  
Stephen Matuszczak ◽  
Harald D. H. Stöver ◽  
C. Grant Willson ◽  
Berndt Reck
Keyword(s):  
Chemical Amplification

New Negative Deep-UV Resist for KrF Excimer Laser Lithography

1989 ◽  
pp. 269-279
Author(s):  
Masayuki Endo ◽  
Yoshiyuki Tani ◽  
Masaru Sasago ◽  
Noboru Nomura
Keyword(s):  
Excimer Laser ◽  
Laser Lithography ◽  
Deep Uv ◽  
Krf Excimer Laser

Acid-Catalyzed Cross-Linking in Phenolic-Resin-Based Negative Resists

1989 ◽  
pp. 86-99 ◽  
Author(s):  
A. K. Berry ◽  
K. A. Graziano ◽  
L. E. Bogan ◽  
J. W. Thackeray
Keyword(s):  
Phenolic Resin ◽  
Cross Linking ◽  
Acid Catalyzed
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