Multiscale Modeling of Nanoscale Aggregation Phenomena: Applications in Semiconductor Materials Processing

The necessity of fixed abrasive CMP in polishing semiconductor materials processing was analyzed. Compared the shortcomings of traditional free abrasive polishing with the advantages of fixed abrasive polishing, the applications of fixed abrasive polishing technology in semiconductor processing were described. A variety of fixed abrasive polishing pad production methods were introduced. The development trend of fixed abrasive polishing was prospected.

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Cathodoluminescence of Catalyst Crystallites

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100055667 ◽

1982 ◽

Vol 40 ◽

pp. 664-665

Author(s):

E.D. Boyes ◽

P.L. Gai ◽

D.B. Darby ◽

C. Warwick

Keyword(s):

Defect Density ◽

Chemical Properties ◽

Operating Conditions ◽

Semiconductor Materials ◽

Environmental Cell ◽

High Resolution Structure ◽

Commercially Important ◽

Crystallographic Defects ◽

Resolution Structure

The extended crystallographic defects introduced into some oxide catalysts under operating conditions may be a consequence and accommodation of the changes produced by the catalytic activity, rather than always being the origin of the reactivity. Operation without such defects has been established for the commercially important tellurium molybdate system. in addition it is clear that the point defect density and the electronic structure can both have a significant influence on the chemical properties and hence on the effectiveness (activity and selectivity) of the material as a catalyst. SEM/probe techniques more commonly applied to semiconductor materials, have been investigated to supplement the information obtained from in-situ environmental cell HVEM, ultra-high resolution structure imaging and more conventional AEM and EPMA chemical microanalysis.

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Colloidal systems in soils

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100168050 ◽

1994 ◽

Vol 52 ◽

pp. 64-65

Author(s):

J. Thieme ◽

J. Niemeyer ◽

P. Guttman

Keyword(s):

Clay Minerals ◽

Polymeric Materials ◽

Spatial Arrangement ◽

High Specific Surface Area ◽

Turnover Rates ◽

Colloidal Systems ◽

Chemical Conditions ◽

Aggregation Phenomena ◽

Iron And Manganese ◽

Soil Colloids

In soil science the fraction of colloids in soils is understood as particles with diameters smaller than 2μm. Clay minerals, aquoxides of iron and manganese, humic substances, and other polymeric materials are found in this fraction. The spatial arrangement (microstructure) is controlled by the substantial structure of the colloids, by the chemical composition of the soil solution, and by thesoil biota. This microstructure determines among other things the diffusive mass flow within the soils and as a result the availability of substances for chemical and microbiological reactions. The turnover of nutrients, the adsorption of toxicants and the weathering of soil clay minerals are examples of these surface mediated reactions. Due to their high specific surface area, the soil colloids are the most reactive species in this respect. Under the chemical conditions in soils, these minerals are associated in larger aggregates. The accessibility of reactive sites for these reactions on the surface of the colloids is reduced by this aggregation. To determine the turnover rates of chemicals within these aggregates it is highly desirable to visualize directly these aggregation phenomena.

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