Study of the Vaporization of Amalgams with a New Knudsen Cell - Mass Spectrometer System. Part II: The Compounds Mg5Hg3, Mg2Hg, Mg5Hg2, and Mg3Hg and the Formation Enthalpies of All Compounds of the Mg - Hg System

1984 ◽  
Vol 88 (1) ◽  
pp. 37-41 ◽  
Author(s):  
K. Hilpert
1986 ◽  
Vol 75 ◽  
Author(s):  
Harold F. Winters ◽  
D. Haarer

AbstractIt has been recognized for some time that the doping level in silicon influences etch rate in plasma environments[1–8]. We have now been able to reproduce and investigate these doping effects in a modulated-beam, mass spectrometer system described previously [9] using XeF2 as the etchant gas. The phenomena which have been observed in plasma reactors containing fluorine atoms are also observed in our experiments. The data has led to a model which explains the major trends.


Tellus B ◽  
2004 ◽  
Vol 56 (4) ◽  
pp. 322-338 ◽  
Author(s):  
RALPH F. KEELING ◽  
TEGAN BLAINE ◽  
BILL PAPLAWSKY ◽  
LAURA KATZ ◽  
CHRIS ATWOOD ◽  
...  

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