Measurement of changes in atmospheric Ar/N2 ratio using a rapid-switching, single-capillary mass spectrometer system

Tellus B ◽  
2004 ◽  
Vol 56 (4) ◽  
pp. 322-338 ◽  
Author(s):  
RALPH F. KEELING ◽  
TEGAN BLAINE ◽  
BILL PAPLAWSKY ◽  
LAURA KATZ ◽  
CHRIS ATWOOD ◽  
...  
Keyword(s):  
Mass Spectrometer ◽  
Mass Spectrometer System ◽  
Spectrometer System ◽  
Rapid Switching

scholarly journals Measurement of changes in atmospheric Ar/N2ratio using a rapid-switching, single-capillary mass spectrometer system

Tellus B ◽  
2004 ◽  
Vol 56 (4) ◽  
pp. 322-338 ◽  
Author(s):  
Ralph F. Keeling ◽  
Tegan Blaine ◽  
Bill Paplawsky ◽  
Laura Katz ◽  
Chris Atwood ◽  
...  
Keyword(s):  
Mass Spectrometer ◽  
Mass Spectrometer System ◽  
Spectrometer System ◽  
Rapid Switching

The Influence of Doping on the Etching of Si(111)

1986 ◽  
Vol 75 ◽  
Author(s):  
Harold F. Winters ◽  
D. Haarer
Keyword(s):  
Mass Spectrometer ◽  
Doping Level ◽  
Etch Rate ◽  
Plasma Reactors ◽  
Doping Effects ◽  
Mass Spectrometer System ◽  
Spectrometer System

AbstractIt has been recognized for some time that the doping level in silicon influences etch rate in plasma environments[1–8]. We have now been able to reproduce and investigate these doping effects in a modulated-beam, mass spectrometer system described previously [9] using XeF2 as the etchant gas. The phenomena which have been observed in plasma reactors containing fluorine atoms are also observed in our experiments. The data has led to a model which explains the major trends.

A mass spectrometer system for analysis of polar stratospheric aerosols

2002 ◽  
Vol 73 (2) ◽  
pp. 446-452 ◽  
Author(s):  
J. Schreiner ◽  
C. Voigt ◽  
P. Zink ◽  
A. Kohlmann ◽  
D. Knopf ◽  
...  
Keyword(s):  
Mass Spectrometer ◽  
Mass Spectrometer System ◽  
Spectrometer System ◽  
Stratospheric Aerosols
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