Lateral outward growth of single-crystal diamond by two different structures of microwave plasma reactors

On a semi-open holder, the homoepitaxial lateral growth of single-crystal diamond (SCD) was carried out via microwave plasma chemical vapor deposition (MPCVD). By tuning and optimizing two different structures of...

Controlled Growth of Silicon Particles via Plasma Pulsing and their Application as Battery Material

The use of silicon nanoparticles for lithium-ion batteries requires a precise control over both their average size and their size distribution. Particles larger than the generally accepted critical size of 150 nm fail during lithiation because of excessive swelling, while very small particles (<10 nm) inevitably lead to a poor first cycle coulombic efficiency because of their excessive specific surface area. Both mechanisms induce irreversible capacity losses and are detrimental to the anode functionality. In this manuscript we describe a novel approach for enhanced growth of nanoparticles to ~20 nm using low-temperature flow-through plasma reactors via pulsing. Pulsing of the RF power leads to a significant increase in the average particle size, all while maintaining the particles well below the critical size for stable operation in a lithium-ion battery anode. A zero-dimensional aerosol plasma model is used to investigate the dynamics of particle agglomeration and growth in the pulsed plasma reactor. The accelerated growth correlates with the shape of the particle size distribution in the afterglow, which is in turn controlled by parameters such as metastable density, gas and electron temperature. The accelerated agglomeration in each afterglow phase is followed by rapid sintering of the agglomerates into single-crystal particles in the following plasma-on phase. This study highlights the potential of non-thermal plasma reactors for the synthesis of functional nanomaterials, while also underscoring the need for better characterization of their fundamental parameters in transient regimes.

Carbon nanostructure growth: new application of magnetron discharge

Purpose: The application of a common magnetron discharge to the growth of carbon nanostructures is studied. The simplicity of the proposed technique can be beneficial for the development of new plasma reactors for large-scale production of carbon nanostructures. Design/methodology/approach: Graphite cathode was treated by carbon-containing powder accelerated by use of nozzle, and then aged in hydrogen. Superposition of glow and arc discharges was obtained, when putting the cathode under the negative biasing with respect to the walls of a vacuum chamber. The pulsed discharge was preserved through the whole time of treatment. This process was explained in terms of interaction of glow discharge plasma with a surface of the cathode made of non-melting material. Findings: The plasma treatment resulted in generation of the diverse nanostructures confirmed by SEM and TEM images. Spruce-like nanostructures and nanofibers are observed near the cathode edge where the plasma was less dense; a grass-like structure was grown in the area of “race-track”; net-like nanostructures are found among the nanofibers. These findings allow concluding about the possible implementation of the proposed method in industry. Research limitations/implications: The main limitation is conditioned by an explosive nature of nanostructure generation in arcs; thus, more elaborate design of the setup should be developed in order to collect the nanospecies in the following study. Practical implications: High-productivity plasma process of nanosynthesis was confirmed in this research. It can be used for possible manufacturing of field emitters, gas sensors, and supercapacitors. Originality/value: Synthesis of carbon nanostructures is conducted by use of a simple and well-known technique of magnetron sputtering deposition where a preliminary surface treatment is added to expand the production yield and diversity of the obtained nanostructures.

On the spectra of natural waves in a plasma waveguide in the presence of collisions

The dispersion characteristics of surface and evanescent waves in metal-dielectric-plasma-dielectric-metal structure in the presence of collisions are investigated analytically and numer ically. In the absence of absorption, when the electron density passes through the doubled critical value, a rearrangement of the eigenwave structure, associated with the appearance of surface waves, occurs. A rearrangement also occurs in an absorbing plasma, but the numbers of reconnecting modes depend on the size of the structure and the ratio of the electron collision frequency to the field frequency. Correct consideration of this process is necessary for the analytical analysis of the field structure in plasma reactors, the design of plasma antennas, and the solution of other problems of plasma electrodynamics.

The Oleofobization of Paper via Plasma Treatment

Cellulose is a promising biomass material suitable for high volume applications. Its potential lies in sustainability, which is becoming one of the leading trends in industry. However, there are certain drawbacks of cellulose materials which limit their use, especially their high wettability and low barrier properties, which can be overcome by applying thin coatings. Plasma technologies present a high potential for deposition of thin environmentally friendly and recyclable coatings. In this paper, two different plasma reactors were used for coating two types of cellulose-based substrates with hexamethyldisiloxane (HMDSO). The changes in surface characteristics were measured by atomic force microscopy (AFM), scanning electron microscopy (SEM), surface free energy and contact angles measurements, X-ray photoelectron spectroscopy (XPS), and secondary ion mass spectrometry (SIMS). Successful oleofobization was observed for an industrial scale reactor where pure HMDSO was used in the absence of oxygen.

Surface plasma with an inkjet-printed patterned electrode for low-temperature applications

The global health crisis caused by the recent pandemic has led to increasing social demand for ‘new normal’ sanitizing and disinfecting facilities to fit our ‘new normal’ lives. Here, we introduce an inkjet-printed, thin-film plasma source applicable to dry disinfection processes. In contrast to conventional plasma reactors, the merits of plasma produced on a film include disposability, cost-effectiveness, and applicability to high-dimensional objects such as the human body. The developed flexible plasma film can be applied to a wide variety of shapes via origami—remaining plasma stable even when bent. However, electrode degradation has been a practical issue in the long-term operation of inkjet-printed plasma sources, which is troublesome from application perspectives. We focus on making the inkjet-printed electrode more plasma stress-resistant, thereby increasing its lifespan from a few minutes to two hours of continuous operation with optimal inkjet printing and passivation, thus increasing the practicality of the source. Considering the fact that ozone and nitrogen oxides are selectively produced by plasma, we implement a disposable pouch-type plasma source and examine its usefulness in extending the shelf life of food.