ChemInform Abstract: HTFFR KINETICS STUDIES OF TIN NITROUS OXIDE, A HIGHLY EFFICIENT CHEMILUMINESCENT REACTION

A supersonic flow reactor comprising a shock tube and convergent-divergent expansion nozzle has been developed and used to study the chemiluminescent reaction between tin atoms and nitrous oxide. The reaction has been found to excite the a-X, b-X and A-X transitions of SnO and rate constants for formation of the three excited states have been found to have the same activation energy, 25�5 kJ mol-1. Estimates of branching ratios have been made on the basis of experimental measurement and kinetic modelling and an assessment of the Sn/N2O reaction as a possible electronic chemical laser is made.

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Rhodium Encapsulated within Silicalite‐1 Zeolite as Highly Efficient Catalyst for Nitrous Oxide Decomposition: From Single Atoms to Nanoclusters and Nanoparticles

European Journal of Inorganic Chemistry ◽

10.1002/ejic.202100106 ◽

2021 ◽

Author(s):

Shiwei Wang ◽

Bo Yan ◽

Juan Chai ◽

Tianhao Li ◽

Hongbo Yu ◽

...

Keyword(s):

Nitrous Oxide ◽

Nitrous Oxide Decomposition ◽

Efficient Catalyst ◽

Single Atoms ◽

Highly Efficient ◽

Oxide Decomposition

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HTFFR kinetics studies of the Ge/N2O chemiluminescent reaction

The Journal of Chemical Physics ◽

10.1063/1.439725 ◽

1980 ◽

Vol 72 (8) ◽

pp. 4315-4323 ◽

Cited By ~ 8

Author(s):

Arthur Fontijn ◽

William Felder

Keyword(s):

Kinetics Studies ◽

Chemiluminescent Reaction

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Highly efficient ultrasonic-assisted removal of Hg(II) ions on graphene oxide modified with 2-pyridinecarboxaldehyde thiosemicarbazone: Adsorption isotherms and kinetics studies

Ultrasonics Sonochemistry ◽

10.1016/j.ultsonch.2016.04.030 ◽

2016 ◽

Vol 33 ◽

pp. 118-128 ◽

Cited By ~ 88

Author(s):

Azadeh Tadjarodi ◽

Somayeh Moazen Ferdowsi ◽

Rouholah Zare-Dorabei ◽

Ahmad Barzin

Keyword(s):

Graphene Oxide ◽

Adsorption Isotherms ◽

Kinetics Studies ◽

Highly Efficient ◽

Adsorption Isotherms And Kinetics ◽

Ultrasonic Assisted

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Reaction couples of ceramic thin films prepared by CVD

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100106053 ◽

1988 ◽

Vol 46 ◽

pp. 798-799

Author(s):

D.W. Susnitzky ◽

S.R. Summerfelt ◽

C.B. Carter

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Solid State Reactions ◽

Spatial Distributions ◽

Diffusion Couples ◽

Kinetics Studies ◽

Ceramic Thin Films ◽

Initial Stage

Solid-state reactions have traditionally been studied in the form of diffusion couples. This ‘bulk’ approach has been modified, for the specific case of the reaction between NiO and Al2O3, by growing NiAl2O4 (spinel) from electron-transparent Al2O3 TEM foils which had been exposed to NiO vapor at 1415°C. This latter ‘thin-film’ approach has been used to characterize the initial stage of spinel formation and to produce clean phase boundaries since further TEM preparation is not required after the reaction is completed. The present study demonstrates that chemical-vapor deposition (CVD) can be used to deposit NiO particles, with controlled size and spatial distributions, onto Al2O3 TEM specimens. Chemical reactions do not occur during the deposition process, since CVD is a relatively low-temperature technique, and thus the NiO-Al2O3 interface can be characterized. Moreover, a series of annealing treatments can be performed on the same sample which allows both Ni0-NiAl2O4 and NiAl2O4-Al2O3 interfaces to be characterized and which therefore makes this technique amenable to kinetics studies of thin-film reactions.

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