ChemInform Abstract: Electrochromic Properties of Niobium Oxide Thin Films Prepared by Chemical Vapor Deposition.

10.1002/chin.199504008 ◽

2010 ◽

Vol 26 (4) ◽

pp. no-no

Author(s):

T. MARUYAMA ◽

T. KANAGAWA

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Niobium Oxide ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Electrochromic Properties

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Electrochromic Properties of Niobium Oxide Thin Films Prepared by Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2059247 ◽

1994 ◽

Vol 141 (10) ◽

pp. 2868-2871 ◽

Author(s):

Toshiro Maruyama ◽

Tetsuya Kanagawa

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Niobium Oxide ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Electrochromic Properties

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Electrochromic Properties of Iron Oxide Thin Films Prepared by Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1836697 ◽

1996 ◽

Vol 143 (5) ◽

pp. 1675-1677 ◽

Author(s):

Toshiro Maruyama ◽

Tetsuya Kanagawa

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Electrochromic Properties

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The electrochromic properties of nickel oxide thin films prepared by chemical vapor deposition

Solar Energy Materials and Solar Cells ◽

10.1016/0927-0248(93)90145-s ◽

1993 ◽

Vol 30 (3) ◽

pp. 257-262 ◽

Author(s):

Toshiro Maruyama ◽

Susumu Arai

Keyword(s):

Chemical Vapor Deposition ◽

Nickel Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Electrochromic Properties ◽

Nickel Oxide Thin Films

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ChemInform Abstract: Electrochromic Properties of Cobalt Oxide Thin Films Prepared by Chemical Vapor Deposition.

10.1002/chin.199633005 ◽

2010 ◽

Vol 27 (33) ◽

pp. no-no

Author(s):

T. MARUYAMA ◽

S. ARAI

Keyword(s):

Chemical Vapor Deposition ◽

Cobalt Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Electrochromic Properties

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Electrochromic Properties of Cobalt Oxide Thin Films Prepared by Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1836646 ◽

1996 ◽

Vol 143 (4) ◽

pp. 1383-1386 ◽

Author(s):

Toshiro Maruyama ◽

Susumu Arai

Keyword(s):

Chemical Vapor Deposition ◽

Cobalt Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Electrochromic Properties

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ChemInform Abstract: Electrochromic Properties of Manganese Oxide Thin Films Prepared by Chemical Vapor Deposition.

10.1002/chin.199601005 ◽

2010 ◽

Vol 27 (1) ◽

pp. no-no

Author(s):

T. MARUYAMA ◽

Y. OSAKI

Keyword(s):

Chemical Vapor Deposition ◽

Manganese Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Electrochromic Properties

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The Quality Improvement of Yttrium Oxide Thin Films Grown at Low Temperature via the 3 rd Generation Mist Chemical Vapor Deposition Using Oxygen Supporting Sources

physica status solidi (b) ◽

10.1002/pssb.202100105 ◽

2021 ◽

Author(s):

Li Liu ◽

Toshiyuki Kawaharamura ◽

Masahito Sakamoto ◽

Misaki Nishi ◽

Giang T. Dang ◽

...

Keyword(s):

Quality Improvement ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Yttrium Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films

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Electrical conduction in 10–20 nm thick polycrystalline tin oxide thin films deposited by chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2008.11.047 ◽

2009 ◽

Vol 517 (9) ◽

pp. 2953-2958 ◽

Author(s):

Yuji Matsui ◽

Yuichi Yamamoto

Keyword(s):

Chemical Vapor Deposition ◽

Tin Oxide ◽

Electrical Conduction ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

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Study the Physical Properties Antimony Doped Zinc Oxide Thin Films Prepared by Chemical Vapor Deposition

Rafidain Journal of Science ◽

10.33899/rjs.2012.59641 ◽

2012 ◽

Vol 23 (6) ◽

pp. 163-179

Author(s):

Basil H. Nasir ◽

Mekhaiel I. Manssor

Keyword(s):

Chemical Vapor Deposition ◽

Physical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films

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LOW PRESSURE CHEMICAL VAPOR DEPOSITION OF TIN OXIDE THIN FILMS FROM AN ORGANOMETALLIC COMPOUND. APPLICATION TO GAS DETECTION

Journal de Physique IV (Proceedings) ◽

10.1051/jp4:1991237 ◽

1991 ◽

Vol 02 (C2) ◽

pp. C2-303-C2-310 ◽

Author(s):

C. PIJOLAT ◽

L. BRUNO ◽

R. LALAUZE

Keyword(s):

Chemical Vapor Deposition ◽

Tin Oxide ◽

Vapor Deposition ◽

Organometallic Compound ◽

Chemical Vapor ◽

Low Pressure ◽

Gas Detection ◽

Oxide Thin Films ◽

Pressure Chemical

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