Microstructures of a-axis oriented YBa2Cu3O7−x films made by newly developed de 100 MHz hybrid plasma sputtering were investigated using transmission electron microscopy (TEM). The films deposited on (110) NdGaO3 and (100) SrTiO3 substrates were found to grow in a perfect epitaxial fashion and with clear interface. The plan view of the TEM image showed that both films were comprised of two kinds of grains having the c axis aligning along two perpendicular directions in the plane with equal probability. The structures of the grain boundary, however, were found to be very different for the two films from the plan views. The film on NdGaO3 showed a lot of twist boundaries, while the film on SrTiO3 consisted of many symmetrical tilt boundaries and basal-plane-faced tilt boundaries. The type of grain boundary is determined by the anisotropic growth rates of the film between c direction and a-b direction.
Macroscopic modelling of stress driven anisotropic growth in bioengineered tissues
