Directly confirming the Z 1/2 center as the electron trap in SiC through accessing the non‐radiative recombination

Author(s):  
Yuxiang Gu ◽  
Lin Shi ◽  
Jun-Wei Luo ◽  
Shu-Shen Li ◽  
Lin-Wang Wang
2014 ◽  
Vol 1638 ◽  
Author(s):  
Kazuma Ikeda ◽  
Masafumi Yamaguchi ◽  
Boussairi Bouzazi ◽  
Nobuaki Kojima ◽  
Yoshio Ohshita

ABSTRACTWe review recent progresses on in-situ observation of lattice relaxation of III-V lattice-mismatched system and analyses of defect properties in III-V-N solar cell materials. We found that there were five phases during the InGaAs growth on GaAs substrate. The transition point of the dominant dislocation behavior could be determined precisely. We also found that compositionally step-graded InGaAs/GaAs(001) buffers with overshooting (OS) layers were effective to control the strain of the top layer from tensile to compression. To understand the defect properties that dominate the electrical property of CBE-grown GaAsN films, we characterized deep levels in CBE-grown GaAsN films by DLTS. In this characterization, a well-known electron trap E1 (Ec-0.33eV) center in n-GaAsN and p-GaAsN was confirmed to be non-radiative recombination center by using double-carrier pulse DLTS.


1988 ◽  
Vol 102 ◽  
pp. 47-50
Author(s):  
K. Masai ◽  
S. Hayakawa ◽  
F. Nagase

AbstractEmission mechanisms of the iron Kα-lines in X-ray binaries are discussed in relation with the characteristic temperature Txof continuum radiation thereof. The 6.7 keV line is ascribed to radiative recombination followed by cascades in a corona of ∼ 100 eV formed above the accretion disk. This mechanism is attained for Tx≲ 10 keV as observed for low mass X-ray binaries. The 6.4 keV line observed for binary X-ray pulsars with Tx> 10 keV is likely due to fluorescence outside the He II ionization front.


1959 ◽  
Vol 68 (6) ◽  
pp. 247-260 ◽  
Author(s):  
V.S. Vavilov

2003 ◽  
Vol 775 ◽  
Author(s):  
Suk-Ho Choi ◽  
Jun Sung Bae ◽  
Kyung Jung Kim ◽  
Dae Won Moon

AbstractSi/SiO2 multilayers (MLs) have been prepared under different deposition temperatures (TS) by ion beam sputtering. The annealing at 1200°C leads to the formation of Si nanocrystals in the Si layer of MLs. The high resolution transmission electron microscopy images clearly demonstrate the existence of Si nanocrystals, which exhibit photoluminescence (PL) in the visible range when TS is ≥ 300°C. This is attributed to well-separation of nanocrystals in the higher-TS samples, which is thought to be a major cause for reducing non-radiative recombination in the interface between Si nanocrystal and surface oxide. The visible PL spectra are enhanced in its intensity and are shifted to higher energy by increasing TS. These PL behaviours are consistent with the quantum confinement effect of Si nanocrystals.


2019 ◽  
Author(s):  
Pierfrancesco Aversa ◽  
Senol Öz ◽  
Eunhwan Jung ◽  
Olivier Plantevin ◽  
Olivier Cavani ◽  
...  

Author(s):  
Masafumi YAMAGUCHI ◽  
HITOSHI TAMPO ◽  
Hajime SHIBATA ◽  
Kan-hua Lee ◽  
Kenji ARAKI ◽  
...  

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