Терагерцевая генерация в эпитаксиальных пленках InAs

We present the results of terahertz generation studies under excitation via femtosecond lasers pulses epitaxial films of InAs, which were synthesized on semi-insulating and highly doped GaAs substrates. It is shown that a terahertz emitter based on epitaxial InAs film grown on a heavily doped GaAs n-type substrate, has the same terahertz generation efficiency as the InAs-film emitter grown on a semi-isolating GaAs substrate, but it has a significantly better spectral resolution, which is mainly determined by the parameters of the optical delay line and the femtosecond laser’s stability.

Effect of the ultra-low arsenic flux on characteristics of In(As) nanostructures formed during droplet epitaxy

In this paper, we present the results of an experimental study of the influence of the ultra-low arsenic flux on the parameters of In nanodroplets obtained by droplet epitaxy on the GaAs substrate. We demonstrate that the arsenic flux can be used to alter the size of droplets without changing their surface density. An increase in the arsenic flux leads to a reduction of the nanostructure size or their complete decay. However, we demonstrate that certain growth conditions allow providing saturation of the size of nanostructures (∼30 nm) which ensures good reproducibility of the process. The mechanism of ring and hole formation at various arsenic fluxes is also discussed.

Effects of substrate phonon absorption on the resonance behavior of metal-insulator-metal metamaterial terahertz absorbers

We have investigated effects of substrate phonon absorption on the resonance behavior of metal-insulator-metal double layer metamaterial absorbers in the terahertz frequency range. A sharp resonant absorption dip is clearly observed for a metamaterial-on-ground-plane structure fabricated on a GaAs substrate when THz radiation is incident from the surface metamaterials side. However, when the THz is incident from the substrate side to the ground-plane-on-metamaterial structures fabricated on a GaAs substrate, the resonance dip is almost merged into the broad background of acoustic phonon absorption. The resonant absorption is recovered when the GaAs substrate is replaced with a high-resistivity Si substrate.

GaAs Nanomembranes in the High Electron Mobility Transistor Technology

A 100 nm MOCVD-grown HEMT AlGaAs/InGaAs/GaAs heterostructure nanomembrane was released from the growth GaAs substrate by ELO using a 300 nm AlAs layer and transferred to sapphire. The heterostructure contained a strained 10 nm 2DEG In0.23Ga0.77As channel with a sheet electron concentration of 3.4 × 1012 cm−2 and Hall mobility of 4590 cm2V−1s−1, which was grown close to the center of the heterostructure to suppress a significant bowing of the nanomembrane both during and after separation from the growth substrate. The as-grown heterostructure and transferred nanomembranes were characterized by HRXRD, PL, SEM, and transport measurements using HEMTs. The InGaAs and AlAs layers were laterally strained: ~−1.5% and ~−0.15%. The HRXRD analysis showed the as-grown heterostructure had very good quality and smooth interfaces, and the nanomembrane had its crystalline structure and quality preserved. The PL measurement showed the nanomembrane peak was shifted by 19 meV towards higher energies with respect to that of the as-grown heterostructure. The HEMTs on the nanomembrane exhibited no degradation of the output characteristics, and the input two-terminal measurement confirmed a slightly decreased leakage current.