scholarly journals Geodesic Methods for Shape and Surface Processing

Author(s):  
Gabriel Peyré ◽  
Laurent D. Cohen
Keyword(s):  
2014 ◽  
Vol 4 (1) ◽  
pp. 69-78 ◽  
Author(s):  
Toshihiko Yoshimura ◽  
Kentaro Shiraishi ◽  
Tatsuhiro Takeshima ◽  
Motonori Komura ◽  
Tomokazu Iyoda

MRS Bulletin ◽  
1992 ◽  
Vol 17 (6) ◽  
pp. 52-57 ◽  
Author(s):  
S.T. Picraux ◽  
E. Chason ◽  
T.M. Mayer

Why are low-energy ions relevant to the surface processing of electronic materials? The answer lies in the overriding trend of miniaturization in microelectronics. The achievement of these feats in ultrasmall architecture has required surface processing capabilities that allow layer addition and removal with incredible precision. The resulting benefits of greater capacity and speed at a plummeting cost per function are near legendary.The ability of low-energy ions to enhance the precision of surface etching, cleaning, and deposition/growth processes (Figure 1) provides one basis for the interest in ion-assisted processes. Low-energy ions are used, for example, to enhance the sharpness of side walls in plasma etching and to improve step coverage by metal layers in sputter deposition. Emerging optoelectronic applications such as forming ridges for wave-guides and ultrasmooth vertical surfaces for lasers further extend piesent requirements, and low-energy ions again provide one tool to help in this area of ultraprecise materials control. Trends associated with the decreased feature size include the movement from wet chemical processing to dry processing, the continuing need for reductions in defect densities, and the drive toward reduced temperatures and times in process steps.How do the above trends focus interest on studies of low-energy ion-assisted processes? In current applications, these trends are driving the need for increased atomic-level understanding of the ion-enhancement mechanisms, for example, in reactive ion etching to minimize defect production and enhance surface chemical reactions.


1990 ◽  
Vol 9 (10) ◽  
pp. 379-383 ◽  
Author(s):  
T.R. Jervis ◽  
D.L. Williamson ◽  
J.-P. Hirvonen ◽  
T.G. Zocco

2016 ◽  
Author(s):  
Takamichi Hirasawa ◽  
Michihiro Yamamoto

2010 ◽  
Vol 5 ◽  
pp. 395-403 ◽  
Author(s):  
E. Ukar ◽  
A. Lamikiz ◽  
L.N. López de Lacalle ◽  
S. Martinez ◽  
F. Liébana ◽  
...  

1975 ◽  
Vol 97 (1) ◽  
pp. 25-31 ◽  
Author(s):  
K. M. Kulkarni ◽  
J. A. Schey

Hydrostatic extrusion of annealed 1100 aluminum was investigated experimentally at ambient temperature. The principal variables studied were lubricant viscosity which was varied from less than 100 to over 76,000 SUS at 100 deg F and the diametral clearance between the follower block and the extrusion cylinder which ranged from 0.0005 to 0.0030 in. for the 1.026 in. dia. cylinder. The specimen diameter was 0.97 or 1.00 in. corresponding to an extrusion ratio of 4.75 or 5.00, respectively. The included die angle was either 60 deg or 90 deg. The results show that with a proper combination of the lubricant viscosity and the follower block clearance, hydrostatic extrusion can be accomplished without the necessity of any sealing of the container on the follower block side. The optimum clearance for minimum breakthrough pressure increases as the lubricant viscosity increases. The extrusion force increases with die angle. The paper discusses the various factors that affect the magnitude of the breakthrough pressure and the occasional uneven bamboo-type appearance of the surface. Processing conditions must be selected carefully since the lowest extrusion force does not necessarily lead to a product with the best surface finish.


Hyomen Kagaku ◽  
2014 ◽  
Vol 35 (2) ◽  
pp. 74-77
Author(s):  
Osamu ERYU ◽  
Yayoi TANAKA

2007 ◽  
Vol 19 (3) ◽  
pp. 1363-1369 ◽  
Author(s):  
Raghuvir Singh ◽  
S. Ghosh Chowdhury ◽  
S. K. Tiwari ◽  
Narendra B. Dahotre

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