Coulometric Nanotitrators with Potentiometric Endpoint Detection

1998 ◽  
pp. 340-347 ◽  
Author(s):  
O. T. Guenat ◽  
Ph. Arquint ◽  
W. E. Morf ◽  
B. H. van der Schoot ◽  
N. F. de Rooij
Keyword(s):  
Endpoint Detection

Advanced Fringe Analysis Techniques in Circuit Edit

2006 ◽  
Author(s):  
R.K. Jain ◽  
T. Malik ◽  
T.R. Lundquist ◽  
C.-C. Tsao ◽  
W.J. Walecki
Keyword(s):  
Imaging System ◽  
Success Rates ◽  
Endpoint Detection ◽  
Fringe Analysis ◽  
Analysis Techniques ◽  
Aspect Ratios ◽  
Slope Correction ◽  
Trench Area ◽  
And Control ◽  
Thickness Measurements

Abstract Novel Fabry Perot [1] fringe analysis techniques for monitoring the etching process with a coaxial photon-ion column [2] in the Credence OptiFIB are reported. Presently the primary application of these techniques in circuit edit is in trenching either from the front side or from the backside of a device. Optical fringes are observed in reflection geometry through the imaging system when the trench floor is thin and semi-transparent. The observed fringes result from optical interference in the etalon formed between the trench floor (Si in the case of backside trenching) and the circuitry layer beyond the trench floor. In-situ real-time thickness measurements and slope correction techniques are proposed that improve endpoint detection and control planarity of the trench floor. For successful through silicon edits, reliable endpoint detection and co-planarity of a local trench is important. Reliable endpoint detection prevents milling through bulk silicon and damaging active circuitry. Uneven trench floor thickness results in premature endpoint detection with sufficient thickness remaining in only part of the trench area. Good co-planarity of the trench floor also minimizes variability in the aspect ratios of the edit holes, hence increasing success rates in circuit edit.

Holographic Lithography with Endpoint Detection of Resist Development

1993 ◽  
Vol 32 (Part 1, No. 7) ◽  
pp. 3321-3327
Author(s):  
Hiroaki Kawata ◽  
Nobuo Kasamatsu ◽  
Kenji Murata
Keyword(s):  
Holographic Lithography ◽  
Endpoint Detection

Optical spectral emission endpoint detection for passivation etch

2009 ◽  
Author(s):  
Yue Kok Hong Kenneth ◽  
Chin Chye Seng ◽  
Chin Tiong Tay ◽  
Se Kwang Leong James ◽  
Boon Kiat Goh
Keyword(s):  
Endpoint Detection ◽  
Spectral Emission

Endpoint Detection in Cu-CMP

2006 ◽  
Vol 153 (9) ◽  
pp. G830 ◽  
Author(s):  
S. Kondoju ◽  
C. Juncker ◽  
P. Lucas ◽  
S. Raghavan ◽  
P. Fischer ◽  
...  
Keyword(s):  
Endpoint Detection ◽  
Cu Cmp

Evaluating endpoint detection algorithms for isolated word from Malay parliamentary speech

2010 ◽  
Author(s):  
Noraini Seman ◽  
Zainab Abu Bakar ◽  
Nordin Abu Bakar ◽  
Haslizatul Fairuz Mohamed ◽  
Nur Atiqah Sia Abdullah ◽  
...  
Keyword(s):  
Endpoint Detection ◽  
Detection Algorithms ◽  
Isolated Word

scholarly journals Optical endpoint detection for plasma reduction of graphene oxide

AIP Advances ◽  
2013 ◽  
Vol 3 (3) ◽  
pp. 032121 ◽  
Author(s):  
MaengJun Kim ◽  
Yung Ho Kahng ◽  
Yong Jae Kim ◽  
T. Prem kumar ◽  
KwangMook Park ◽  
...  
Keyword(s):  
Graphene Oxide ◽  
Endpoint Detection ◽  
Plasma Reduction
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