Pulsed Laser-Plasma Deposition of Thin Films, and Film Structures

1998 ◽  
pp. 228-246 ◽  
Author(s):  
Simeon M. Metev ◽  
Vadim P. Veiko
Keyword(s):  
Thin Films ◽  
Laser Plasma ◽  
Plasma Deposition ◽  
Pulsed Laser

Plasma parameters in pulsed laser-plasma deposition of thin films

1996 ◽  
pp. 122-125
Author(s):  
S. Metev ◽  
M. Ozegowski ◽  
G. Sepold ◽  
S. Burmester
Keyword(s):  
Thin Films ◽  
Laser Plasma ◽  
Plasma Deposition ◽  
Pulsed Laser ◽  
Plasma Parameters

Plasma parameters in pulsed laser-plasma deposition of thin films

1996 ◽  
Vol 96-98 ◽  
pp. 122-125 ◽  
Author(s):  
S. Metev ◽  
M. Ozegowski ◽  
G. Sepold ◽  
S. Burmester
Keyword(s):  
Thin Films ◽  
Laser Plasma ◽  
Plasma Deposition ◽  
Pulsed Laser ◽  
Plasma Parameters

Growth Mechanism and Film Properties in Pulsed Laser-Plasma Deposition

1991 ◽  
Vol 236 ◽  
Author(s):  
S. Metev ◽  
K. Meteva
Keyword(s):  
Laser Plasma ◽  
Growth Process ◽  
Plasma Deposition ◽  
Pulsed Laser ◽  
Deposition Process ◽  
Experimental Investigations ◽  
Direct Relation ◽  
Film Properties ◽  
Experimental Conditions ◽  
Laser Flux

AbstractIn the paper the results of a theoretical investigation of the growth process of laser-plasma deposited thin films are discussed. A kinetic approach has been used to establish direct relation between experimental conditions (laser flux density, substrate temperature) and film properties (thickness, structure). The results of some experimental investigations of the deposition process are presented confirming the general conclusions of the developed theoretical model.

Growth Mechanism and Film Properties in Pulsed Laser-Plasma Deposition

1991 ◽  
Vol 235 ◽  
Author(s):  
S. Metev ◽  
K. Meteva
Keyword(s):  
Laser Plasma ◽  
Growth Process ◽  
Plasma Deposition ◽  
Pulsed Laser ◽  
Deposition Process ◽  
Experimental Investigations ◽  
Direct Relation ◽  
Film Properties ◽  
Experimental Conditions ◽  
Laser Flux

ABSTRACTIn the paper the results of a theoretical investigation of the growth process of laser-plasma deposited thin films are discussed. A kinetic approach has been used to establish direct relation between experimental conditions (laser flux density, substrate temperature) and film properties (thickness, structure). The results of some experimental investigations of the deposition process are presented confirming the general conclusions of the developed theoretical model.

Design and installation of a CO2-pulsed laser plasma deposition system for the growth of mass product nanostructures

2013 ◽  
Vol 28 (13) ◽  
pp. 1747-1752 ◽  
Author(s):  
Muhammad Sajjad ◽  
Xiaoyan Peng ◽  
Jin Chu ◽  
Hongxin Zhang ◽  
Peter Feng
Keyword(s):  
Laser Plasma ◽  
Plasma Deposition ◽  
Pulsed Laser ◽  
Image Position

Abstract

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

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